Dr. Jian Yin Profile

Dr. Jian Yin

at EMD Electronics

SPIE Involvement:

Author

Publications (9)

Proceedings Article | 25 March 2016 Paper

Directed self-assembly materials for high resolution beyond PS-b-PMMA

Eri Hirahara, Margareta Paunescu, Orest Polishchuk, EunJeong Jeong, Edward Ng, Jianhui Shan, Jian Yin, Jihoon Kim, Yi Cao, Jin Li, SungEun Hong, Durairaj Baskaran, Guanyang Lin

Proceedings Volume 9779, 977914 (2016) https://doi.org/10.1117/12.2220424

KEYWORDS: Directed self assembly, Semiconducting wafers, Scanning electron microscopy, Etching, Silicon, Optical lithography, Polymers, Line edge roughness, Photomicroscopy, Annealing

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Proceedings Article | 22 March 2016 Paper

Manufacturability of dense hole arrays with directed self-assembly using the CHIPS flow

Arjun Singh, Jaewoo Nam, Jongsu Lee, Boon Teik Chan, Hengpeng Wu, Jian Yin, Yi Cao, Roel Gronheid

Proceedings Volume 9777, 97770P (2016) https://doi.org/10.1117/12.2219261

KEYWORDS: Optical lithography, Plasma etching, Materials processing, Manufacturing, Lithography, Process control, Directed self assembly, Polymer thin films, Polymethylmethacrylate, Photoresist materials, Cadmium, Electron beam lithography, Critical dimension metrology

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Proceedings Article | 20 March 2015 Paper

Patterning sub-25nm half-pitch hexagonal arrays of contact holes with chemo-epitaxial DSA guided by ArFi pre-patterns

Arjun Singh, Boon Teik Chan, Doni Parnell, Hengpeng Wu, Jian Yin, Yi Cao, Roel Gronheid

Proceedings Volume 9425, 94250X (2015) https://doi.org/10.1117/12.2086352

KEYWORDS: Etching, Photoresist materials, Polymethylmethacrylate, Optical lithography, Electron beam lithography, Extreme ultraviolet lithography, Plasma, Lithography, Plasma etching, Directed self assembly

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Proceedings Article | 19 March 2015 Paper

Toward high-performance quality meeting IC device manufacturing requirements with AZ SMART DSA process

JiHoon Kim, Jian Yin, Yi Cao, YoungJun Her, Claire Petermann, Hengpeng Wu, Jianhui Shan, Tomohiko Tsutsumi, Guanyang Lin

Proceedings Volume 9423, 94230R (2015) https://doi.org/10.1117/12.2086160

KEYWORDS: Picosecond phenomena, Line edge roughness, Semiconducting wafers, Line width roughness, Critical dimension metrology, Optical lithography, Polymethylmethacrylate, Etching, Plasma etching, Directed self assembly

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Proceedings Article | 2 April 2014 Paper

Novel metrology methods for fast 3D characterization of directed self-assembly (DSA) patterns for high volume manufacturing

Chandra Sarma, Benjamin Bunday, Aron Cepler, Ted Dziura, JiHoon Kim, Guanyang Lin, Jian Yin

Proceedings Volume 9050, 90500O (2014) https://doi.org/10.1117/12.2046785

KEYWORDS: Semiconducting wafers, Scatterometry, Metrology, Polymethylmethacrylate, Bridges, Data modeling, Critical dimension metrology, Picosecond phenomena, Line edge roughness, Directed self assembly

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Proceedings Article | 27 March 2014 Paper

Investigation of cross-linking poly(methyl methacrylate) as a guiding material in block copolymer directed self-assembly

Robert Seidel, Paulina Rincon Delgadillo, Abelardo Ramirez-Hernandez, Hengpeng Wu, Youngjun Her, Jian Yin, Paul Nealey, Juan de Pablo, Roel Gronheid

Proceedings Volume 9051, 90510K (2014) https://doi.org/10.1117/12.2048179

KEYWORDS: Polymethylmethacrylate, Picosecond phenomena, Etching, Scanning electron microscopy, Chemistry, Ions, Photoresist materials, Lithography, Neodymium, Directed self assembly

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Proceedings Article | 4 December 2008 Paper

Bottom anti-reflective coating for hyper NA process: theory, application and material development

Huirong Yao, JoonYeon Cho, Jian Yin, Salem Mullen, Guanyang Lin, Mark Neisser, Ralph Dammel

Proceedings Volume 7140, 71402X (2008) https://doi.org/10.1117/12.804617

KEYWORDS: Absorption, Polymers, Lithography, Absorbance, Refractive index, Reflectivity, Etching, Bottom antireflective coatings, Immersion lithography, Antireflective coatings

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Proceedings Article | 15 April 2008 Paper

High-etch-rate low-bias bow outgassing BARC via-filling materials for 193-nm ArF lithographic process

Huirong Yao, Zhong Xiang, Salem Mullen, Jian Yin, Walter Liu, Jianhui Shan, Elleazar Gonzalez, Guanyang Lin, Mark Neisser

Proceedings Volume 6923, 69232J (2008) https://doi.org/10.1117/12.773400

KEYWORDS: Etching, Lithography, Polymers, Reflectivity, Semiconducting wafers, Coating, Immersion lithography, Chromophores, Scanning electron microscopy, Bottom antireflective coatings

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Proceedings Article | 6 April 2007 Paper

Organic ArF bottom anti-reflective coatings for immersion lithography

Zhong Xiang, Hong Zhuang, Hengpeng Wu, Jianhui Shan, Dave Abdallah, Jian Yin, Salem Mullen, Huirong Yao, Eleazar Gonzalez, Mark Neisser

Proceedings Volume 6519, 651929 (2007) https://doi.org/10.1117/12.710669

KEYWORDS: Etching, Reflectivity, Immersion lithography, Photomasks, Chemical vapor deposition, Lithography, Bottom antireflective coatings, Semiconducting wafers, Control systems, Signal attenuation

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Showing 5 of 9 publications

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