Ms. Jianfang He Profile

Jianfang He

at Institute of Microelectronics of the CAS

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Author

Publications (5)

Proceedings Article | 10 April 2024 Poster + Paper

Source optimization based on compression sensing for plasmonic lithography

Jianfang He, Ziqi Li, Huwen Ding, Lisong Dong, Yayi Wei

Proceedings Volume 12953, 1295316 (2024) https://doi.org/10.1117/12.3010575

KEYWORDS: Lithography, Plasmonics, Mathematical optimization, Photoresist materials, Matrices, Compressed sensing, Imaging systems, Reconstruction algorithms, Evanescence, Image resolution

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SPIE Journal Paper | 19 January 2023

Curvilinear mask optimization with refined generative adversarial nets

Qingchen Cao, Peng Xu, Song Sun, Jianfang He, Juan Wei, Jiangliu Shi, Yayi Wei

JM3, Vol. 22, Issue 01, 013201, (January 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.1.013201

KEYWORDS: Gallium nitride, Optical proximity correction, Design and modelling, Lithography, Education and training, Source mask optimization, Model-based design, Computer simulations, Contour modeling, Adversarial training

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Proceedings Article | 20 September 2020 Poster + Paper

Analysis and mitigation of forbidden pitch effects for EUV lithography

Ling Ma, Lisong Dong, Taian Fan, Xiaojing Su, Jianfang He, Ruixuan Wu, Yumei Zhou, Yayi Wei

Proceedings Volume 11517, 115171B (2020) https://doi.org/10.1117/12.2573145

KEYWORDS: Extreme ultraviolet lithography, Lithography, Nanoimprint lithography, Computational lithography, Source mask optimization, Deep ultraviolet, Manufacturing, Photomasks, Optimization (mathematics)

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Proceedings Article | 20 March 2018 Paper

The method of optimizing mask parameter suitable for lithography process

Jianfang He, Lisong Dong, Libin Zhang, Lijun Zhao, Yayi Wei, Tianchun Ye

Proceedings Volume 10587, 1058719 (2018) https://doi.org/10.1117/12.2296861

KEYWORDS: Photomasks, Lithography, Source mask optimization, Calibration, Visualization, Metals, Geometrical optics, 3D acquisition, Manufacturing

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SPIE Journal Paper | 24 August 2017

Optimization of the focus monitor mark in immersion lithography according to illumination type

Lisong Dong, Libin Zhang, Xiaojing Su, Jianfang He, Yayi Wei

JM3, Vol. 16, Issue 03, 033505, (August 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.3.033505

KEYWORDS: Photomasks, Lithographic illumination, Immersion lithography, Phase shifts, Etching, Picosecond phenomena, Diffraction, Lithography, Scanners, Manufacturing

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