Dr. Jie Yang
at Advanced Micro Devices
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 15 March 2012 Paper
Proc. SPIE. 8327, Design for Manufacturability through Design-Process Integration VI
KEYWORDS: Semiconductors, Lithography, Multilayers, Etching, Metals, Manufacturing, Design for manufacturing, Photomasks, Electronic design automation, Resolution enhancement technologies

Proceedings Article | 3 April 2010 Paper
Proc. SPIE. 7641, Design for Manufacturability through Design-Process Integration IV
KEYWORDS: Lithography, Metals, Silicon, Manufacturing, Computer simulations, Design for manufacturing, Optical proximity correction, Standards development, Resolution enhancement technologies, Design for manufacturability

Proceedings Article | 14 March 2009 Paper
Proc. SPIE. 7275, Design for Manufacturability through Design-Process Integration III
KEYWORDS: Lithography, Manufacturing, Printing, Design for manufacturing, Image classification, Optical proximity correction, Tolerancing, Standards development, Resolution enhancement technologies, Design for manufacturability

SPIE Journal Paper | 1 July 2007
JM3 Vol. 6 Issue 03
KEYWORDS: Optical proximity correction, Tolerancing, Photomasks, Critical dimension metrology, Resolution enhancement technologies, Model-based design, Lithography, Computer programming, Capacitance, Semiconductors

Proceedings Article | 28 March 2007 Paper
Proc. SPIE. 6521, Design for Manufacturability through Design-Process Integration
KEYWORDS: Lithography, Manufacturing, Computer simulations, Design for manufacturing, Optical proximity correction, Tolerancing, Optics manufacturing, Standards development, Resolution enhancement technologies, Design for manufacturability

Showing 5 of 8 publications
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