Prof. Jin-Baek Kim Profile

Prof. Jin-Baek Kim

at KAIST

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Author

Publications (23)

Proceedings Article | 2 May 2008 Paper

Top surface imaging study by selective chemisorptions of poly(dimethyl siloxane) on diazoketo-functionalized polymeric surface

Ramakrishnan Ganesan, Seul Ki Youn, Jei-Moon Yun, Jin-Baek Kim

Proceedings Volume 6792, 67920Z (2008) https://doi.org/10.1117/12.798785

KEYWORDS: Silicon, Polymers, Etching, Plasma etching, Plasma, Image processing, Oxygen, Reactive ion etching, Photoresist processing, Line edge roughness

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Top surface imaging (TSI) techniques using vapor or liquid phase silylation have been investigated extensively as alternatives to conventional resist processing. However, earlier imaging schemes such as diffusion enhanced silylated resist (DESIRE) and digital top surface imaging showed several difficulties limiting the successful application of such TSI approaches. In the case of DESIRE, additional CF₄ plasma descum process was required to remove the thin layer of Si incorporated into the cross-linked regions, as some of the Si remained even in the unexposed regions. Also, difference in the cross-linking density and subsequent amount of silicon incorporation across the width of an optically projection printed feature led to non-uniform silylation profiles resulting the difficulty with critical dimension (CD) control of the feature and increased the LER of the overall process. In the case of digital TSI, even though it was developed to overcome these problems with the cross-linking-based silylation process, the concentration of active sites in the exposed polymer varies across the feature width due to the non-uniform energy deposition profile across a feature which results from the non-ideal aerial image produced using optical projection tools. In this study, we have used a diazoketo-functionalized polymer as the platform for the immobilization of amine-functionalized poly(dimethyl siloxane) (amine-PDMS). The diazoketo functional groups undergo Wolff rearrangement to generate carboxylic acid groups upon UV light exposure. This chemistry is exploited to create alternate hydrophilic/hydrophobic patterned regions by selective UV light exposure. The hydrophilic regions that contain carboxylic acid groups predominantly are further used to immobilize amine-PDMS by amide bond formation using carbodiimide coupling chemistry. Due to the high silicon content, the immobilized PDMS acts as the etch barrier for the subsequent oxygen plasma reactive ion etching (O₂-RIE) process. Thus, a negative-tone pattern has been successfully generated using O₂-RIE process. An amine-PDMS with a molecular weight of 900 was used in this study. Auger electron spectroscopy was employed to characterize the immobilization of amine-PDMS onto UV light exposed regions of diazoketo-functionalized polymer surface. Atomic force microscopy was used to study the surface smoothness after O₂-RIE process. Scanning electron microscopy was used to image the pattern profiles formed after O₂-RIE process. High resolution pattern profiles are obtained using the TSI process reported in this study.

Proceedings Article | 12 April 2007 Paper

Patterning of biomolecules on a biocompatible nonchemically amplified resist

Jin-Baek Kim, Ramakrishnan Ganesan, So Young Yoo, Jae-Hak Choi, Sang Yup Lee

Proceedings Volume 6519, 65191L (2007) https://doi.org/10.1117/12.712102

KEYWORDS: Ultraviolet radiation, Optical lithography, Lithography, Polymers, Chemistry, Proteins, Photoresist processing, Glasses, Photoresist materials, Tissue engineering

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Proceedings Article | 2 April 2007 Paper

Nonchemically amplified resists for deep-UV lithography

Ramakrishnan Ganesan, Sumin Kim, Seul Ki Youn, Youngook Cho, Jei-Moon Yun, Jin-Baek Kim

Proceedings Volume 6519, 65192J (2007) https://doi.org/10.1117/12.712113

KEYWORDS: Polymers, Lithography, Resistance, Ultraviolet radiation, Deep ultraviolet, Etching, Printing, Absorbance, Lamps, Diffusion

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Proceedings Article | 7 March 2007 Paper

Pulse-width dependency of the fabricating resolution of the two-photon absorption photo-polymerization

Hong Kong, Shin Yi, Dong-Yol Yang, Kwang-Sup Lee, Jin-Baek Kim, Tae-woo Lim, Sumin Kim

Proceedings Volume 6462, 646202 (2007) https://doi.org/10.1117/12.701393

KEYWORDS: Absorption, Picosecond phenomena, Polymers, Single mode fibers, Mirrors, Nanolithography, Molecules, Laser development, Nanotechnology, Diffraction

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Proceedings Article | 29 March 2006 Paper

Negative nanomolecular resists based on calix[4]resorcinarene

Tae-Hwan Oh, Ramakrishnan Ganesan, Je-Moon Yoon, Jin-Baek Kim

Proceedings Volume 6153, 61532G (2006) https://doi.org/10.1117/12.660111

KEYWORDS: Epoxies, Silicon, Semiconducting wafers, Lithography, Photoresist materials, Etching, Scanning electron microscopy, Near ultraviolet, Cesium, Chemistry

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Proceedings Article | 29 March 2006 Paper

Synthesis of photobleachable deep UV resists based on single component nonchemically amplified resist system

Kyoung-Seon Kim, Su-Min Kim, Ji-Young Park, Jin-Baek Kim

Proceedings Volume 6153, 61532H (2006) https://doi.org/10.1117/12.660634

KEYWORDS: Polymers, Deep ultraviolet, Lithography, Etching, Polymerization, Absorption, Photoresist processing, Lamps, Printing, FT-IR spectroscopy

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Proceedings Article | 4 May 2005 Paper

Synthesis of copolymers containing diazoketo groups and their application as DUV resists

Jin-Baek Kim, Kyoung-Seon Kim

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599493

KEYWORDS: Polymers, Ultraviolet radiation, Deep ultraviolet, Photoresist materials, Lithography, FT-IR spectroscopy, Semiconducting wafers, Lamps, Absorption, Absorbance

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Proceedings Article | 4 May 2005 Paper

Nanomolecular resists with adamantane core for 193-nm lithography

Jin-Baek Kim, Tae-Hwan Oh, Kyoungmi Kim

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599589

KEYWORDS: Lithography, Silicon, Polymers, Image enhancement, Molecules, Etching, Coating, Crystals, Nitrogen, Semiconducting wafers

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Proceedings Article | 4 May 2005 Paper

Bilayer resists based on polyhedral oligomeric silsesquioxane for 193-nm lithography

Ramakrishnan Ganesan, Jae-Hak Choi, Hyo-Jin Yun, Young-Gil Kwon, Kyoung-Seon Kim, Tae-Hwan Oh, Jin-Baek Kim

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599622

KEYWORDS: Lithography, Silicon, Ultraviolet radiation, Absorbance, Standards development, Polymers, Semiconducting wafers, Sodium, Photomicroscopy, Solids

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Proceedings Article | 4 May 2005 Paper

Encapsulation of light emitting materials and photo-patterning using B-cyclodextrin

Jin-Baek Kim, Ji-Young Park

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600269

KEYWORDS: Absorption, Solids, Zinc, Absorbance, Lithography, Aluminum, Ultraviolet radiation, Chemistry, Organic materials, Molecules

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Proceedings Article | 14 May 2004 Paper

Water-developable resists based on glyceryl methacrylate for 193-nm lithography

Jin-Baek Kim, Ji-Hyun Jang, Jae-Hak Choi, Kwan-Ku Lee, Jong-Sung Ko

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534533

KEYWORDS: Polymers, Lithography, Resistance, Silicon, Etching, Polymerization, Semiconducting wafers, Silicon films, Lamps, Printing

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Proceedings Article | 12 June 2003 Paper

Synthesis of norbornene copolymers with diazo groups and their application as DUV resists

Jin-Baek Kim, Kyoung Seon Kim

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485104

KEYWORDS: Polymers, Deep ultraviolet, Ultraviolet radiation, Lithography, FT-IR spectroscopy, Photoresist materials, Absorbance, Sodium, Polymerization, Semiconducting wafers

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Proceedings Article | 12 June 2003 Paper

Nonshrinkable photoresists for ArF lithography

Jin-Baek Kim, Tae Hwan Oh, Jae-Hak Choi, Jae-Jun Lee

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485074

KEYWORDS: Polymers, Sodium, Photoresist materials, Lithography, Carbon, Chromatography, Silica, Chemically amplified resists, Spectroscopy, Oxidation

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Proceedings Article | 24 July 2002 Paper

Novel alicyclic polymers having 7,7-dimethyloxepan-2-one acid labile groups for ArF lithography

Jae-Jun Lee, Jin-Baek Kim, Kenji Honda

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474206

KEYWORDS: Polymers, Silicon, Lithography, Photoresist materials, Polymerization, Semiconducting wafers, Chemically amplified resists, Spectroscopy, Ultraviolet radiation, Information operations

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Proceedings Article | 24 July 2002 Paper

Novel molecular resists based on inclusion complex of cyclodextrin

Jin-Baek Kim, Young-Gil Kwon, Hyo-Jin Yun, Jae-Hak Choi

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474286

KEYWORDS: Molecules, Polymers, Resistance, Photoresist materials, Solids, Silicon, Lithography, Semiconducting wafers, Silicon films, Etching

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Proceedings Article | 24 July 2002 Paper

Molecular resists with t-butyl cholate as a dendrimer core

Jin-Baek Kim, Tae Hwan Oh, Young-Gil Kwon

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474255

KEYWORDS: Dendrimers, Etching, Resistance, Polymers, Silicon, Lithography, Semiconducting wafers, Absorbance, Photoresist materials, Chlorine

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Proceedings Article | 23 June 2000 Paper

Chemically amplified resists based on norbornene polymer with 2-trimethylsilyl-2-propyl ester protecting group

Jin-Baek Kim, Jae-Jun Lee, Jae-Sung Kang

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388271

KEYWORDS: Polymers, Silicon, Lithography, Reactive ion etching, Chemically amplified resists, Photoresist developing, Oxygen, Excimer lasers, Imaging systems, Ultraviolet radiation

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Proceedings Article | 11 June 1999 Paper

Acid diffusion and evaporation in chemically amplified resists

Jin-Baek Kim, Young-Gil Kwon, Jae-Hak Choi, Min-Ho Jung

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350236

KEYWORDS: Diffusion, Polymers, Chemically amplified resists, Semiconducting wafers, Silicon, Absorbance, Deep ultraviolet, Optical filters, Chemistry, Molecules

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Proceedings Article | 11 June 1999 Paper

Chemically amplified resist based on the methacrylate polymer with 2-trimethylsilyl-2-propyl ester protecting group

Jin-Baek Kim, Hyun-Woo Kim, Si-Hyeung Lee, Sang-Jun Choi, Joo-Tae Moon

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350224

KEYWORDS: Polymers, Silicon, Oxygen, Ions, Reactive ion etching, Chemically amplified resists, Photoresist processing, Photoresist developing, Lithography, Imaging systems

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Proceedings Article | 11 June 1999 Paper

Chemically amplified resists based on acrylate polymers containing ketal groups in the side chains

Jin-Baek Kim, Jong Jin Park, Ji Hyun Jang, Jae-Young Kim

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350247

KEYWORDS: Polymers, Diffusion, Deep ultraviolet, Chemically amplified resists, Photoresist materials, Lithography, Catalysis, Polymerization, Photoresist developing, Molecules

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Proceedings Article | 11 June 1999 Paper

Chemically amplified resists based on the norbornene copolymers with steroid derivatives

Jin-Baek Kim, Bum-Wook Lee, Jae-Sung Kang, Seong-Ju Kim, Joo Hyeon Park, Dong-Chul Seo, Ki-Ho Baik, Jae Chang Jung, Chi-Hyeong Roh

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350194

KEYWORDS: Polymers, Resistance, Lithography, Excimer lasers, Photoresist materials, Polymerization, Plasma, Chemically amplified resists, Photoresist developing, Standards development

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Proceedings Article | 29 June 1998 Paper

New dry-developable chemically amplified photoresist

Jin-Baek Kim, Hyun-Woo Kim

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312386

KEYWORDS: Polymers, Photoresist materials, Silicon, Photoresist processing, Reactive ion etching, Photoresist developing, Oxygen, Lithography, Imaging systems, Ultraviolet radiation

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Proceedings Article | 7 July 1997 Paper

Environmentally stable chemically amplified positive resist containing vinyllactam terpolymers

Cheol-Kyu Bok, Cha-Won Koh, Min-Ho Jung, Ki-Ho Baik, Jin-Baek Kim, Jong-Ho Cheong

Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275852

KEYWORDS: Lithography, Polymers, Contamination, Deep ultraviolet, Semiconducting wafers, Chemically amplified resists, Excimers, Diffusion, Photoresist materials, Polymerization

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Showing 5 of 23 publications

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