Dr. Jin-Goo Park
at Hanyang Univ
SPIE Involvement:
Author
Publications (9)

SPIE Journal Paper | 12 October 2017
JM3 Vol. 16 Issue 04
KEYWORDS: Pellicles, Particles, Extreme ultraviolet, Critical dimension metrology, Extreme ultraviolet lithography, Photomasks, Distortion, Chromium, Scanners, High volume manufacturing

Proceedings Article | 24 March 2017 Paper
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Silicon, Silicon carbide

Proceedings Article | 26 September 2016 Paper
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Pellicles, Extreme ultraviolet, Optical lithography, Critical dimension metrology, Extreme ultraviolet lithography, Photomasks, Lead, Lithography, Contamination, Neodymium

SPIE Journal Paper | 7 October 2015
JM3 Vol. 14 Issue 04
KEYWORDS: Extreme ultraviolet, Pellicles, Reflectivity, Extreme ultraviolet lithography, Semiconducting wafers, Radiation effects, Deep ultraviolet, Photomasks, Silicon carbide, Mirrors

Proceedings Article | 9 July 2015 Paper
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Photomasks, Critical dimension metrology, Particles, Extreme ultraviolet lithography, Mass attenuation coefficient, Optical lithography, Iron, Aluminum, Metals, Extreme ultraviolet

Showing 5 of 9 publications
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