Prof. Jinho Ahn Profile

Prof. Jinho Ahn

Professor at Hanyang Univ

SPIE Involvement:

Conference Program Committee | Author | Instructor

Publications (48)

Proceedings Article | 10 April 2024 Poster + Paper

A novel solution for next-generation EUV pellicle: breathable membrane with increased transmittance

Haneul Kim, Jungyeon Kim, Young-Woo Kang, Min-woo Kim, Tae Joong Ha, Gi Sung Lee, Hye-Keun Oh, Jinho Ahn

Proceedings Volume 12953, 129531B (2024) https://doi.org/10.1117/12.3011123

KEYWORDS: Pellicles, Porosity, Transmittance, Extreme ultraviolet, Simulations, Film thickness, Lithography, Extreme ultraviolet lithography, Finite element methods, Critical dimension metrology

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Proceedings Article | 10 April 2024 Presentation

Vertically tailored hybrid multilayer EUV photoresist with vertical molecular wire structure

Myung Mo Sung, Hyeonseok Ji, Jaehyuk Lee, Jinho Ahn, Chang Gyoun Kim, Sangsul Lee, Yasin Ekinci, Prajith Karadan, Dimitrios Kazazis

Proceedings Volume PC12953, PC129530K (2024) https://doi.org/10.1117/12.3009753

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Photoresist materials, Line width roughness, Synchrotron radiation, Monolayers, Solubility, Resistance, Reproducibility, Outgassing

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Proceedings Article | 10 April 2024 Presentation + Paper

EUV reflectometry and scatterometry for thin layer and periodic structure characterization

Tao Shen, Iacopo Mochi, Paolo Ansuinelli, Dongmin Jeong, Jinho Ahn, Yasin Ekinci

Proceedings Volume 12955, 129550D (2024) https://doi.org/10.1117/12.3010875

KEYWORDS: Extreme ultraviolet, Reflectometry, Scatterometry, Grazing incidence, Diffraction, Diffraction gratings, Reflectivity, Overlay metrology

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Proceedings Article | 22 November 2023 Poster

Fizeau interferometry for evaluating EUV attenuated phase shift mask

Donggi Lee, Seungchan Moon, Jin Hyuk Choi, Seok Ho Song, Jinho Ahn

Proceedings Volume PC12750, PC127500S (2023) https://doi.org/10.1117/12.2687429

KEYWORDS: Phase shifts, Extreme ultraviolet, Refractive index, Interferometers, EUV optics, Ruthenium, Flat optics, Thin films, Film thickness, Optical coherence

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Proceedings Article | 21 November 2023 Poster + Paper

Platinum-based alloy absorber with improved etching properties for next-generation EUV mask

Yunsoo Kim, Dongmin Jeong, Seungho Lee, Jinho Ahn

Proceedings Volume 12750, 127500R (2023) https://doi.org/10.1117/12.2685114

KEYWORDS: Etching, Alloys, Thin films, Extreme ultraviolet, Platinum, Optical properties, Ion implantation, 3D mask effects, Ions, Tungsten

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Proceedings Article | 21 November 2023 Poster + Paper

Experimental investigation of the mask diffraction light blocking with critical-sized Sn particles on the EUV pellicle

Seungchan Moon, Dong Gi Lee, Jinhyuk Choi, Junho Hong, Jinho Ahn

Proceedings Volume 12750, 127500Z (2023) https://doi.org/10.1117/12.2687444

KEYWORDS: Diffraction, Particles, Pellicles, Tin, Extreme ultraviolet, Deformation, Image restoration, Extreme ultraviolet lithography, Lithography, Imaging systems

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Proceedings Article | 21 November 2023 Presentation + Paper

Molybdenum carbide pellicle for high-power EUV lithography

Yongkyung Kim, Kihun Seong, Jonghyuk Yoon, Donggi Lee, Seungchan Moon, Sung Kyu Jang, Hyun-Mi Kim, Seul-Gi Kim, Jinho Ahn, Hyeongkeun Kim

Proceedings Volume 12750, 127500L (2023) https://doi.org/10.1117/12.2686314

KEYWORDS: Extreme ultraviolet lithography, Pellicles, Extreme ultraviolet, Plasma, Molybdenum, Transmittance, Hydrogen, High volume manufacturing, Semiconducting wafers, Scattering

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Proceedings Article | 15 August 2023 Presentation + Paper

EUV reflective coherent diffraction imaging system for wafer metrology

Tao Shen, Paolo Ansuinelli, Iacopo Mochi, Young Woo Kang, Jinho Ahn, Yasin Ekinci

Proceedings Volume 12618, 126180N (2023) https://doi.org/10.1117/12.2673832

KEYWORDS: Scatterometry, Reflectometry, Reflectivity, Diffraction gratings, Semiconducting wafers, Coherence imaging, Metrology, Extreme ultraviolet, Diffraction, Imaging systems

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Proceedings Article | 14 April 2023 Poster

Effect of pellicle wrinkles on EUV reflectivity and local critical dimension

Seungchan Moon, Dong gi Lee, Jinhyuk Choi, Jinho Ahn

Proceedings Volume PC12494, PC124940F (2023) https://doi.org/10.1117/12.2655991

KEYWORDS: Extreme ultraviolet, Pellicles, Reflectivity, Critical dimension metrology, Diffraction, Spatial frequencies, Scanners, Reconstruction algorithms, Optical properties, Microscopes

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Proceedings Article | 14 April 2023 Poster

Impact of MoSi2 crystal structure on nano-membrane emissivity

Haneul Kim, Seong Ju Wi, Young-Woo Kang, Won Jin Kim, Jinho Ahn

Proceedings Volume PC12494, PC124940L (2023) https://doi.org/10.1117/12.2658601

KEYWORDS: Crystals, Pellicles, Extreme ultraviolet, Annealing, Extreme ultraviolet lithography, Composites, Wet etching, Transmittance, Thermal modeling, Temperature metrology

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Proceedings Article | 1 December 2022 Paper

Removal behavior of Sn and Pb contaminants on EUV mask after EUV exposure

Dong-Hyeon Kwon, Hyun-Gyu Kang, Tae-Gon Kim, Jin-Ho Ahn, Sang-Sul Lee, Jin-Goo Park

Proceedings Volume 12293, 122930B (2022) https://doi.org/10.1117/12.2641800

KEYWORDS: Particles, Tin, Lead, Ruthenium, Extreme ultraviolet lithography, Silicon, Atomic force microscopy, Extreme ultraviolet

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Proceedings Article | 16 November 2022 Presentation

Damage-free pinpoint particle removal for EUV pellicle cleaning

Hyun-Gyu Kang, Dong Hyeon Kwon, Tae-Gon Kim, Jin-Ho Ahn, Byung-Hoon Lee, Jin-Goo Park, Hwan Seok Seo, Hee Bom Kim

Proceedings Volume PC12293, PC1229308 (2022) https://doi.org/10.1117/12.2641583

KEYWORDS: Pellicles, Particles, Extreme ultraviolet, Safety, Particle systems, Particle contamination, Atomic force microscopy, Silica, Optical microscopes, Nanomanipulation

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Proceedings Article | 11 November 2022 Presentation

Investigation of ZrSi2 for application to EUV pellicle

Seong Ju Wi, Chang Soo Kim, Haneul Kim, Jaehyuck Choi, Kyoung-Won Seo, Jinho Ahn

Proceedings Volume PC12292, PC122920G (2022) https://doi.org/10.1117/12.2641822

KEYWORDS: Extreme ultraviolet, Pellicles, EUV optics, Transmittance, Reflectivity, Optical fabrication, Extreme ultraviolet lithography, Composites, Zirconium, Thermography

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Proceedings Article | 11 November 2022 Presentation

Experimental demonstration for the influence of EUV pellicle wrinkles on the mask 3D effects

Dong gi Lee, Young Woong Kim, Seungchan Moon, Jinhyuk Choi, Seong Ju Wi, Jinho Ahn

Proceedings Volume PC12292, PC122920I (2022) https://doi.org/10.1117/12.2641801

KEYWORDS: Photomasks, Pellicles, Extreme ultraviolet, Diffraction, Reconstruction algorithms, Phase retrieval, Microscopes, Lithographic illumination, Inspection, Image retrieval

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Proceedings Article | 11 November 2022 Presentation

Feasibility of nanometer-thickness molybdenum carbide film for extreme ultraviolet lithography pellicle

Yongkyung Kim, Kihun Seong, Donggi Lee, Seungchan Moon, Hyun-Mi Kim, Hyeongkeun Kim, Seul-Gi Kim, Jinho Ahn

Proceedings Volume PC12292, PC122920H (2022) https://doi.org/10.1117/12.2643003

KEYWORDS: Pellicles, Extreme ultraviolet lithography, Extreme ultraviolet, Molybdenum, Hydrogen, Transmittance, Photomasks, Scattering, Scanners, Plasma

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Proceedings Article | 31 October 2022 Poster

Alternative EUV mask with platinum-tungsten alloy for high-NA EUV lithography

Yunsoo Kim, Dongmin Jeong, Minsun Cho, Jinho Ahn

Proceedings Volume PC12292, PC122920U (2022) https://doi.org/10.1117/12.2641805

KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Platinum, Etching, Tungsten, Refractive index, 3D image processing, Thin films, Phase shifts

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Proceedings Article | 13 June 2022 Poster

Impact of thermal expansion coefficient on the local tilt angle of extreme ultraviolet pellicle

Chang Soo Kim, Jung Hwan Kim, Seong Ju Wi, Ha Neul Kim, Young Woo Kang, Won Jin Kim, Jinho Ahn

Proceedings Volume 12051, 120510S (2022) https://doi.org/10.1117/12.2614355

KEYWORDS: Pellicles, Extreme ultraviolet, Numerical analysis, Finite element methods, Computer simulations

Proceedings Article | 13 June 2022 Poster

Effect of diffraction phase control for EUV phase shift mask

Dongmin Jeong, Deukgyu Kim, Yunsoo Kim, Minsun Cho, Jinho Ahn

Proceedings Volume PC12051, PC120510V (2022) https://doi.org/10.1117/12.2614362

KEYWORDS: Diffraction, Extreme ultraviolet, Phase shifts

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SPIE Journal Paper | 1 February 2022 Open Access

Impact of thermal expansion coefficient on the local tilt angle of extreme ultraviolet pellicle

Junghwan Kim, Haneul Kim, Jinho Ahn

JM3, Vol. 21, Issue 01, 014401, (February 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.1.014401

KEYWORDS: Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Finite element methods, Silicon, Refractive index, Heat flux, Signal attenuation, Optical lithography, Numerical analysis

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Proceedings Article | 30 September 2021 Poster + Presentation

Photochemical study of metal infiltrated e-beam resist using vapor-phase infiltration for EUV applications

Su Min Hwang, Aditya Raja Gummadavelly, Dan Le, Yong Chan Jung, Jean-Francois Veyan, Nikhill Tiwale, Chang-Yong Nam, Jinho Ahn, Jiyoung Kim

Proceedings Volume 11854, 118541C (2021) https://doi.org/10.1117/12.2601033

KEYWORDS: Extreme ultraviolet, Metals, Atomic layer deposition, Polymethylmethacrylate, Photoresist processing, FT-IR spectroscopy, Extreme ultraviolet lithography, Silicon, Resistance, Printed circuit board testing

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Proceedings Article | 28 September 2021 Poster + Presentation

Effect of wrinkles on pellicle reflectivity and local critical dimension

Dong gi Lee, Young Woong Kim, Seungchan Moon, Jinho Ahn

Proceedings Volume 11854, 118541H (2021) https://doi.org/10.1117/12.2600988

KEYWORDS: Reflectivity, Pellicles, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Microscopes, Diffraction, Image restoration, High volume manufacturing

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SPIE Journal Paper | 25 May 2021

Impact of residual stress on the deflection of extreme ultraviolet pellicles

Junghwan Kim, Haneul Kim, Jinho Ahn

JM3, Vol. 20, Issue 02, 024401, (May 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.2.024401

KEYWORDS: Pellicles, Extreme ultraviolet, Finite element methods, Silicon, Extreme ultraviolet lithography, Structural analysis, Scanners, Protactinium, Image processing, Transmittance

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Proceedings Article | 22 February 2021 Poster + Presentation

Actinic mask imaging using EUV ptychography microscope

Young Woong Kim, Byungmin Yoo, Dong Gi Lee, Chang Mo Ku, Joong Hwee Cho, Jinho Ahn

Proceedings Volume 11609, 116091Y (2021) https://doi.org/10.1117/12.2587895

KEYWORDS: Photomasks, Extreme ultraviolet, Microscopes, Reconstruction algorithms, Phase retrieval, Phase measurement, Image quality, Semiconductors, Semiconductor manufacturing, Phase shifts

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Proceedings Article | 22 February 2021 Poster + Presentation

Fabrication and evaluation of nickel-based high-k mask for high numerical aperture extreme ultraviolet lithography

Dongmin Jeong, Yoon Jong Han, Deuk Gyu Kim, Yunsoo Kim, Jinho Ahn

Proceedings Volume 11609, 116091U (2021) https://doi.org/10.1117/12.2586778

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Nickel, Mass attenuation coefficient, Dry etching, Nanoimprint lithography, High volume manufacturing, Extreme ultraviolet, Crystals

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Proceedings Article | 22 February 2021 Poster + Presentation

Experimental validation of particle impact on thermo-mechanical behavior of EUV pellicle

Yong Ju Jang, Seong Ju Wi, Chang Soo Kim, Ha Neul Kim, Jinho Ahn

Proceedings Volume 11609, 116091X (2021) https://doi.org/10.1117/12.2587398

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Proceedings Article | 20 September 2020 Presentation

Mo Silicide EUV pellicle

Ha Neul Kim, Yong Ju Jang, Seong Ju Wi, Chang Soo Kim, Jinho Ahn

Proceedings Volume 11517, 115170A (2020) https://doi.org/10.1117/12.2572975

KEYWORDS: Pellicles, Extreme ultraviolet, Reflectivity, Extreme ultraviolet lithography, Semiconducting wafers, Reflection, Molybdenum, Low pressure chemical vapor deposition, Silicon, Wet etching

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Proceedings Article | 16 October 2019 Presentation

Through-pellicle inspection using EUV ptychography microscope (Conference Presentation)

Young Woong Kim, Dong Gon Woo, Yong Ju Jang, Seong Ju Wi, Jinho Ahn, Seunghyeok Shin, Whoi-Yul Kim

Proceedings Volume 11147, 1114722 (2019) https://doi.org/10.1117/12.2538720

KEYWORDS: Extreme ultraviolet, Inspection, Microscopes, Pellicles, Photomasks, Lithography, Deep ultraviolet, Light sources, Defect detection, Extreme ultraviolet lithography

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SPIE Journal Paper | 28 September 2019 Open Access

Through-pellicle imaging of extreme ultraviolet mask with extreme ultraviolet ptychography microscope

Dong Gon Woo, Young Woong Kim, Yong Ju Jang, Seong Ju Wi, Jinho Ahn

JM3, Vol. 18, Issue 03, 034005, (September 2019) https://doi.org/10.1117/12.10.1117/1.JMM.18.3.034005

KEYWORDS: Extreme ultraviolet, Pellicles, Photomasks, Particles, Semiconducting wafers, Transmittance, Contamination, Inspection, Extreme ultraviolet lithography, Diffraction

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Proceedings Article | 3 October 2018 Presentation + Paper

Development of full-size EUV pellicle with thermal emission layer coating

Juhee Hong, Chulkyun Park, Changhun Lee, Keesoo Nam, Yongju Jang, Seongju Wi, Jinho Ahn

Proceedings Volume 10809, 108090R (2018) https://doi.org/10.1117/12.2501772

KEYWORDS: Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Silicon, Ruthenium, Transmittance, Coating, Reticles, Absorption, Ultraviolet radiation

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Proceedings Article | 16 October 2017 Presentation

Evaluating mechanical characteristic of SiNx EUV pellicle membrane (Conference Presentation)

Yong Ju Jang, Jung Hwan Kim, Jin-ho Ahn

Proceedings Volume 10450, 104500T (2017) https://doi.org/10.1117/12.2281683

KEYWORDS: Silicon, Pellicles, Extreme ultraviolet, Semiconductor lasers, Sensors, Mask cleaning

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SPIE Journal Paper | 7 October 2015

Multistack structure for an extreme-ultraviolet pellicle with out-of-band radiation reduction

Sung-Gyu Lee, Guk-Jin Kim, In-Seon Kim, Jin-ho Ahn, Jin-Goo Park, Hye-Keun Oh

JM3, Vol. 14, Issue 04, 043501, (October 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.4.043501

KEYWORDS: Extreme ultraviolet, Pellicles, Reflectivity, Extreme ultraviolet lithography, Semiconducting wafers, Radiation effects, Deep ultraviolet, Photomasks, Silicon carbide, Mirrors

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Proceedings Article | 19 March 2015 Paper

Multi-stack extreme-ultraviolet pellicle with out-of-band reduction

Sung-Gyu Lee, Guk-Jin Kim, In-Seon Kim, Jin-Ho Ahn, Jin-Goo Park, Hye-Keun Oh

Proceedings Volume 9422, 94221O (2015) https://doi.org/10.1117/12.2086052

KEYWORDS: Extreme ultraviolet, Pellicles, Reflectivity, Semiconducting wafers, Radiation effects, Photomasks, Deep ultraviolet, Silicon, Silicon carbide, Extreme ultraviolet lithography

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Proceedings Article | 13 March 2015 Paper

Evaluation of optical properties of EUV resist underlayer

Jung Sik Kim, Seongchul Hong, Jae Uk Lee, Seung Min Lee, Jung Hwan Kim, Hyun Min Song, Jinho Ahn

Proceedings Volume 9422, 94222E (2015) https://doi.org/10.1117/12.2085755

KEYWORDS: Refractive index, Photons, Photoresist materials, Extreme ultraviolet lithography, Extreme ultraviolet, Critical dimension metrology, Stochastic processes, Line edge roughness, Optical properties, Lithography

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Proceedings Article | 18 March 2014 Paper

Imaging performance of attenuated phase-shift mask using coherent scattering microscope

Jae Uk Lee, SeeJun Jeong, Seong Chul Hong, Seung Min Lee, Jinho Ahn

Proceedings Volume 9048, 90481X (2014) https://doi.org/10.1117/12.2045877

KEYWORDS: Photomasks, Phase shifts, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Microscopes, Inspection, Scattering, Diffraction, Binary data

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Proceedings Article | 1 April 2013 Paper

Stochastic resist patterning simulation using attenuated PSM for EUV lithography

Seongchul Hong, Seejun Jeong, Jae Uk Lee, Seung Min Lee, Jongseok Kim, Jonggul Doh, Jinho Ahn

Proceedings Volume 8679, 867928 (2013) https://doi.org/10.1117/12.2011362

KEYWORDS: Optical lithography, Photomasks, Extreme ultraviolet lithography, Phase shifts, Line edge roughness, Line width roughness, Extreme ultraviolet, Stochastic processes, Critical dimension metrology, Molybdenum

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Proceedings Article | 8 November 2012 Paper

Study for compensation of unexpected image placement error caused by VSB mask writer deflector

Hyun-joo Lee, Min-kyu Choi, Seong-yong Moon, Han-Ku Cho, Jonggul Doh, Jinho Ahn

Proceedings Volume 8522, 852228 (2012) https://doi.org/10.1117/12.964098

KEYWORDS: Vestigial sideband modulation, Photomasks, Associative arrays, Contamination, Electron beams, Beam shaping, Reliability, Calibration, Data modeling, Semiconductors

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Proceedings Article | 23 March 2012 Paper

Printability and inspectability of defects on EUV blank for 2xnm hp HVM application

Sungmin Huh, In-Yong Kang, Chang Young Jeong, Jihoon Na, Dong Ryul Lee, Hwan-seok Seo, Seong-Sue Kim, Chan-Uk Jeon, Jonggul Doh, Gregg Inderhees, Jinho Ahn

Proceedings Volume 8322, 83220K (2012) https://doi.org/10.1117/12.916021

KEYWORDS: Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Bismuth, Defect inspection, High volume manufacturing, Defect detection, Semiconductors

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Proceedings Article | 25 September 2010 Paper

Damage/organic free ozonated DI water cleaning on EUVL Ru capping layer

Seung-ho Lee, Bong-kyun Kang, Hyuk-min Kim, Min-soo Kim, Han-ku Cho, Chan-uk Jeon, Hyung-ho Ko, Han-shin Lee, Jin-ho Ahn, Jin-Goo Park

Proceedings Volume 7823, 78232Z (2010) https://doi.org/10.1117/12.878895

KEYWORDS: Ruthenium, Ozone, Extreme ultraviolet lithography, Oxygen, Gases, Carbon dioxide, Carbon, Scanning probe microscopy, Lithography, Atomic force microscopy

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Proceedings Article | 23 March 2010 Paper

Influence of mask surface roughness on 22nm node extreme ultraviolet lithography

Eun-Jin Kim, Jee-Hye You, Seoung-Sue Kim, Han-Ku Cho, Jinho Ahn, Ilsin An, Hye-Keun Oh

Proceedings Volume 7636, 76362K (2010) https://doi.org/10.1117/12.846895

KEYWORDS: Surface roughness, Extreme ultraviolet lithography, Reflectivity, Photomasks, Carbon, Extreme ultraviolet, Ruthenium, Image processing, Contamination, Optical lithography

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Proceedings Article | 23 September 2009 Paper

Behavior of the molybdenum silicide thin film by 193nm exposure

Sin-Ju Yang, Han-Sun Cha, Jin-ho Ahn, Kee-Soo Nam

Proceedings Volume 7488, 74880M (2009) https://doi.org/10.1117/12.829749

KEYWORDS: Thin films, Transmittance, Oxygen, Laser irradiation, Excimer lasers, Phase shifts, Silicon, Resistance, Surface roughness, Photomasks

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Proceedings Article | 23 September 2009 Paper

The study of the birefringence as MoSi based materials for immersion lithography

Ju-Hyun Kang, Han-Sun Cha, Sin-Ju Yang, Jin-Ho Ahn, Kee-Soo Nam

Proceedings Volume 7488, 748830 (2009) https://doi.org/10.1117/12.829878

KEYWORDS: Birefringence, Thin films, Heat treatments, Crystals, Oxygen, Immersion lithography, Doping, Tantalum, Photomasks, Sputter deposition

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Proceedings Article | 21 March 2008 Paper

The study of attenuated PSM structure for extreme ultraviolet lithography with minimized mask shadowing effect

Chang Young Jeong, Byung Hun Kim, Tae Geun Kim, Sangsul Lee, Eun Jin Kim, Hye-Keun Oh, In-Sung Park, Jinho Ahn

Proceedings Volume 6921, 69213Q (2008) https://doi.org/10.1117/12.772533

KEYWORDS: Reflectivity, Photomasks, Critical dimension metrology, Binary data, Phase shifts, Extreme ultraviolet lithography, Molybdenum, Extreme ultraviolet, Deep ultraviolet, Image processing

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Proceedings Article | 1 November 2007 Paper

A study of haze generation as thin film materials

Ju-Hyun Kang, Han-Sun Cha, Sin-Ju Yang, Chul-Kyu Yang, Jin-Ho Ahn, Kee-Soo Nam, Jong-Min Kim, Manish Patil, Ik-Bum Hur, Sang-Soo Choi

Proceedings Volume 6730, 67304K (2007) https://doi.org/10.1117/12.746684

KEYWORDS: Air contamination, Ions, Nitrogen, Metals, Thin films, Photomasks, Chemical analysis, Inspection, Scanning probe microscopy, Quartz

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Proceedings Article | 30 October 2007 Paper

The behavior of substrate dependency as surface treatment in the positive chemically amplified resist

Sin-Ju Yang, Han-Sun Cha, Ju-Hyun Kang, Chul-Kyu Yang, Jin-Ho Ahn, Kee-Soo Nam

Proceedings Volume 6730, 67300J (2007) https://doi.org/10.1117/12.746652

KEYWORDS: Chromium, Etching, Autoregressive models, Photomasks, Quartz, Dry etching, Oxides, Nitrogen, Interfaces, Ultraviolet radiation

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Proceedings Article | 30 October 2007 Paper

Investigation of airborne molecular contamination adsorption rate as storage materials in mask

Chul-Kyu Yang, Han-Sun Cha, Sin-Ju Yang, Ju-Hyun Kang, Jin-Ho Ahn, Kee-Soo Nam

Proceedings Volume 6730, 67301D (2007) https://doi.org/10.1117/12.746675

KEYWORDS: Thin films, Ions, Adsorption, Photomasks, Air contamination, Quartz, Silicon, Semiconducting wafers, Phase shifts, Contamination

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Proceedings Article | 23 March 2006 Paper

Numerical modeling of absorber characteristics for EUVL

In-Yong Kang, Jinho Ahn, Hye-Keun Oh, Yong-Chae Chung

Proceedings Volume 6151, 615121 (2006) https://doi.org/10.1117/12.655852

KEYWORDS: Tantalum, Chromium, Reflectivity, Extreme ultraviolet lithography, Photomasks, Image processing, Geometrical optics, Systems modeling, Numerical modeling, Lithography

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Proceedings Article | 23 March 2006 Paper

Combined absorber stack for optimization of the EUVL mask

Seung Lee, Tae Kim, Chung Kim, In-Yong Kang, Yong-Chae Chung, Jinho Ahn

Proceedings Volume 6151, 61511Y (2006) https://doi.org/10.1117/12.656928

KEYWORDS: Reflectivity, Deep ultraviolet, Extreme ultraviolet, Aluminum, Ruthenium, Extreme ultraviolet lithography, Photomasks, Etching, Optical simulations, Inspection

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Proceedings Article | 29 June 1998 Paper

Novel antireflective structure for metal layer patterning

Sang-Soo Choi, Han Sun Cha, Jong-Soo Kim, Jong Mun Park, Dohoon Kim, Kag Hyeon Lee, Jin-Ho Ahn, Hai Bin Chung, Bo Woo Kim

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312423

KEYWORDS: Reflectivity, Metals, Optical lithography, Lithography, Absorption, Antireflective coatings, Aluminum, Tin, Optical resolution, Semiconducting wafers

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Showing 5 of 48 publications

Conference Committee Involvement (3)

International Conference on Extreme Ultraviolet Lithography 2024

29 September 2024 | Monterey, California, United States

International Conference on Extreme Ultraviolet Lithography 2023

2 October 2023 | Monterey, California, United States

International Conference on Extreme Ultraviolet Lithography 2022

26 September 2022 | Monterey, California, United States

Course Instructor

SC888: EUV Lithography

This course provides attendees with a full overview of the fundamentals, current status, and technical challenges of EUV Lithography. Topics covered include EUV Sources, EUV Source Metrology, EUV Optics, EUV systems and patterning, and EUV Mask. We will begin with an overview of the history of EUVL and cover EUV sources, EUV source metrology and EUV optics. Next is a discussion of EUVL systems and patterning. We cover the fundamental components of EUV systems and address similarities and differences to optical lithography systems. This section also covers patterning issues including flare, LER, and resist performance. We continue with an exploration of EUVL Mask technology issues such as design, materials including reflective multilayers, process and metrology. Finally we conclude with a Status Review of EUVL. Course material will be drawn from the accompanying texts EUV Sources for Lithography and EUV Lithography.

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