Dr. Byung Jin Choi
at Canon Nanotechnologies, Inc
SPIE Involvement:
Author
Publications (26)

Proceedings Article | 9 March 2021 Presentation + Paper
Proc. SPIE. 11610, Novel Patterning Technologies 2021
KEYWORDS: Semiconductors, Optical lithography, Particles, Manufacturing, Photomasks, Semiconductor manufacturing, Nanoimprint lithography, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 1 March 2021 Presentation + Paper
Proc. SPIE. 11610, Novel Patterning Technologies 2021
KEYWORDS: Lithography, Optical lithography, Ultraviolet radiation, Signal processing, Photomasks, Nanoimprint lithography, Optical alignment, Semiconducting wafers, Wafer testing, Overlay metrology

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11324, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020
KEYWORDS: Semiconductors, Ultraviolet radiation, Distortion, Photomasks, Nanoimprint lithography, Optical alignment, Semiconducting wafers, Wafer testing, Overlay metrology

Proceedings Article | 26 September 2019 Presentation + Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Lithography, Optical lithography, Capillaries, Particles, Photomasks, Semiconductor manufacturing, Nanoimprint lithography, Manufacturing equipment, Semiconducting wafers, Stochastic processes

Proceedings Article | 16 May 2019 Paper
Proc. SPIE. 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
KEYWORDS: Semiconductors, Data modeling, Capillaries, Ultraviolet radiation, Distortion, Photomasks, Nanoimprint lithography, Optical alignment, Semiconducting wafers, Overlay metrology

Showing 5 of 26 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top