CONFERENCE PROCEEDINGS
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Dr. Jing S. Shu
Member of Technical Staff at Texas Instruments Inc
SPIE Involvement:
Author
Publications (4)
Proceedings Article | 20 March 2018 Paper
Improving 130nm node patterning using inverse lithography techniques for an analog process
Can Duan, Scott Jessen, David Ziger, Mizuki Watanabe, Steve Prins, Chi-Chien Ho, Jing Shu
Proceedings Volume 10587, 1058718 (2018) https://doi.org/10.1117/12.2297219
KEYWORDS: Source mask optimization, Lithography, Photomasks, Scanners, Optical proximity correction, Semiconducting wafers, Silicon, Optical lithography
Proceedings Article | 17 May 1994 Paper
I-line photoresist evaluations for contact hole performance with attenuated phase-shift reticles
William Krisa, Cesar Garza, Anthony Yen, Jing Shu
Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175456
KEYWORDS: Reticles, Binary data, Photoresist processing, Photoresist materials, Scanning electron microscopy, Semiconducting wafers, Etching, Phase shifts, Quartz, Photomicroscopy
Proceedings Article | 17 May 1994 Paper
Process optimization for 0.35-um i-line lithography
Cesar Garza, William Krisa, Anthony Yen, Jing Shu
Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175458
KEYWORDS: Photoresist processing, Semiconducting wafers, Lithography, Reticles, Photoresist materials, Scanning electron microscopy, Manufacturing, Printing, Reflectivity, Phase shifts
SPIE Journal Paper | 1 October 1993
Benchmark comparison of i-line, alternating phase shift masks
OE, Vol. 32, Issue 10, (October 1993) https://doi.org/10.1117/12.10.1117/12.147129
KEYWORDS: Phase shifts, Reticles, Photomasks, Quartz, Lithography, Manufacturing, Chemical vapor deposition, Scanning electron microscopy, Photoresist processing, Semiconducting wafers
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