Through the analysis of the light scattering within the ink and paper. we provide the fact of the total incident flux
that contains both the collimated flux and the diffuse flux which were caused by the specular reflection and diffuse
reflection on the air-ink interface in the process of color reproduction. Considering the phenomenon of the energy of
these two parts of the flux are changing constantly, the four-flux kubelka-munk model based on the radiative transfer
equation is given. Also, a new four-flux model for calculation of the reflectance of print with rough substrate is
established with the Beckmann-Spizzichino model which describe the reflectance of the incident flux with arbitrary
rough substrate.
The scattering of light within paper and the ink penetration in the substrate are the key factors which affect the color
reproduction. A reflectance model for color halftone prints is introduced in this paper which considers these factors. The
model is obtained by the extended Murray-Davies model and iterative algorithm. The model described in this paper
contains two parameters, n and v . The n factor equals to the sum of w and v . The w factor relates to the
optical spread function of paper relative to the spatial frequency of the halftone dots. The v factor relates to the
distribution of colorant within the dots. The value of n and v are obtained by simulation according to the
experimental data. For offset lithographic halftone data at 150lpi, the value of n and v are 1.578 and 0.02, thermal
wax transfer halftone ( n =2.292, v =0.0209) and stochastic halftone ( n =1.1853, v =-0.006).
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