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Jinhua Ning
at Shanghai Institute of Technical Physics CAS
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Publications (1)
Proceedings Article | 18 November 2008 Paper
Inductively coupled plasma etching of In1-x-yAlxGayAs in BCl3/Cl2/Ar
Proceedings Volume 7135, 71353I (2008) https://doi.org/10.1117/12.803196
KEYWORDS: Etching, Chlorine, Plasma etching, Plasma, Ions, Indium gallium arsenide, Anisotropic etching, Reactive ion etching, Argon, Scanning electron microscopy
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