Jinhyuck Jun
at SK Hynix Inc
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 4 April 2017 Presentation + Paper
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Lithography, Optical proximity correction, Optical lithography, Manufacturing, Photomasks, Semiconducting wafers, Atrial fibrillation, Source mask optimization, Image processing

Proceedings Article | 24 March 2016 Paper
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Overlay metrology, Optical proximity correction, Diffraction, Critical dimension metrology, Metrology, Scanning electron microscopy, Electron microscopes, Optical lithography, Error analysis, Target detection

Proceedings Article | 18 March 2015 Paper
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Atrial fibrillation, Semiconducting wafers, Photomasks, Critical dimension metrology, Optical proximity correction, Nanoimprint lithography, Lithography, Printing, SRAF, Manufacturing

Proceedings Article | 28 March 2014 Paper
Proc. SPIE. 9053, Design-Process-Technology Co-optimization for Manufacturability VIII
KEYWORDS: Photomasks, Optical proximity correction, SRAF, Printing, Semiconducting wafers, 3D modeling, Calibration, Optimization (mathematics), Source mask optimization, Manufacturing

Proceedings Article | 1 October 2013 Paper
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Optical proximity correction, Image quality, Optimization (mathematics), Nanoimprint lithography, Image enhancement, Image processing, Design for manufacturing, Resolution enhancement technologies, Neodymium, Nano opto mechanical systems

Showing 5 of 10 publications
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