Jin-Hyung Park
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 23 September 2009 Paper
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Photomasks, Inspection, Defect inspection, Lithography, SRAF, Image classification, Wafer-level optics, Semiconducting wafers, Defect detection, Scanning electron microscopy

Proceedings Article | 23 September 2009 Paper
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Inspection, Photomasks, SRAF, Lithography, Defect detection, Reticles, Semiconducting wafers, Image resolution, Image processing, Wafer inspection

Proceedings Article | 16 November 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Inspection, SRAF, Photomasks, Semiconducting wafers, Optical proximity correction, Mask making, Electronics, Critical dimension metrology, Printing, Sensors

Proceedings Article | 25 October 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Inspection, SRAF, Photomasks, Reticles, Optical proximity correction, Defect inspection, Databases, Opacity, Semiconducting wafers, Defect detection

Proceedings Article | 14 May 2007 Paper
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Inspection, Lamps, Photomasks, Deep ultraviolet, Defect detection, SRAF, Particles, Defect inspection, Manufacturing, Resolution enhancement technologies

Showing 5 of 10 publications
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