Mr. Jin-Hyung Park Profile

Jin-Hyung Park

at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 23 September 2009 Paper

Mask pattern recovery by level set method based inverse inspection technology (IIT) and its application on defect auto disposition

Jin-Hyung Park, Paul D. H. Chung, Chan-Uk Jeon, Han Ku Cho, Linyong Pang, Danping Peng, Vikram Tolani, Tom Cecil, David Kim, KiHo Baik

Proc. SPIE. 7488, Photomask Technology 2009

KEYWORDS: Photomasks, Inspection, Defect inspection, Lithography, SRAF, Image classification, Wafer-level optics, Semiconducting wafers, Defect detection, Scanning electron microscopy

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Proceedings Article | 23 September 2009 Paper

Aerial plane inspection for advanced photomask defect detection

Won Sun Kim, Jin Hyung Park, Dong Hoon Chung, Chan Uk Jeon, Han Ku Cho, Trent Hutchinson, Oscar Lee, William Huang, Aditya Dayal

Proc. SPIE. 7488, Photomask Technology 2009

KEYWORDS: Inspection, Photomasks, SRAF, Lithography, Defect detection, Reticles, Semiconducting wafers, Image resolution, Image processing, Wafer inspection

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Proceedings Article | 16 November 2007 Paper

Improving inspectability with KLA-Tencor TeraScan thin line de-sense

Chunlin Chen, David Kim, Ki Hun Park, NamWook Kim, Sang Hoon Han, Jin Hyung Park, Dong Hoon Chung

Proc. SPIE. 6730, Photomask Technology 2007

KEYWORDS: Inspection, SRAF, Photomasks, Semiconducting wafers, Optical proximity correction, Mask making, Electronics, Critical dimension metrology, Printing, Sensors

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Proceedings Article | 25 October 2007 Paper

A pragmatic approach to high sensitivity defect inspection in the presence of mask process variability

Sang Hoon Han, Jin Hyung Park, Dong Hoon Chung, Sang-Gyun Woo, Han Ku Cho, David Kim, Chunlin Chen, Ki-Hun Park, Gregg Inderhees

Proc. SPIE. 6730, Photomask Technology 2007

KEYWORDS: Inspection, SRAF, Photomasks, Reticles, Optical proximity correction, Defect inspection, Databases, Opacity, Semiconducting wafers, Defect detection

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Proceedings Article | 14 May 2007 Paper

Cost-effective pattern inspection system using Xe-Hg lamp in challenge of sub-65-nm node

Won Sun Kim, Jin Hyung Park, Dong-Hoon Chung, Sang-Gyun Woo

Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV

KEYWORDS: Inspection, Lamps, Photomasks, Deep ultraviolet, Defect detection, SRAF, Particles, Defect inspection, Manufacturing, Resolution enhancement technologies

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Proceedings Article | 20 May 2006 Paper

Novel mask inspection flow for better defect review and analysis

Kwon Lim, Jin Hyung Park, Dong Hoon Chung, Seong Woon Choi, Woo Sung Han, Hideo Takizawa, Kouji Miyazaki

Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII

KEYWORDS: Inspection, Photomasks, Defect inspection, Defect detection, Mask making, Image processing, Manufacturing, Deep ultraviolet, Telecommunications, Semiconductors

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Proceedings Article | 4 November 2005 Paper

The detectability of Qz phase defects and its application for 65nm node CPL mask manufacturing

Won Il Cho, Jin Hyung Park, Dong Hoon Chung, Sung Woon Choi, Woo Sung Han

Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Inspection, Photomasks, Defect detection, Deep ultraviolet, Manufacturing, Semiconducting wafers, Resolution enhancement technologies, Optics manufacturing, Lithography, Defect inspection

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Proceedings Article | 4 November 2005 Paper

Implementation of reflected light die-to-die inspection and ReviewSmart to improve 65nm DRAM mask fabrication

Do Young Kim, Won Il Cho, Jin Hyung Park, Dong Hoon Chung, Byung Chul Cha, Seong Woon Choi, Woo Sung Han, Ki Hun Park, Nam Wook Kim, Carl Hess, Weimin Ma, David Kim

Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Inspection, Defect detection, Photomasks, Contamination, Binary data, Defect inspection, Nanoimprint lithography, Deep ultraviolet, Semiconducting wafers, Mask making

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Proceedings Article | 28 June 2005 Paper

Process monitoring system for instant defect detection and analysis in 65 nm node photomask fabrications

Young-Seok Cho, Jin-Hyung Park, Won-Il Cho, Jin-Hong Park, Yong-Hyun Kim, Seong-Woon Choi, Woo-Sung Han

Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII

KEYWORDS: Inspection, Photomasks, Image processing, Etching, Defect detection, Signal processing, Particles, Signal detection, Manufacturing, Contamination

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Proceedings Article | 1 August 2002 Paper

Development of mask-making process for CLM manufacturing technology

Jin-Hyung Park, Dong-Hoon Chung, Man-Ki Lee, In-Kyun Shin, Seong-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn, J. Fung Chen, Douglas Van Den Broeke

Proc. SPIE. 4754, Photomask and Next-Generation Lithography Mask Technology IX

KEYWORDS: Photomasks, Quartz, Etching, Inspection, Manufacturing, Dry etching, Binary data, Resolution enhancement technologies, Optics manufacturing, Lithography

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Showing 5 of 10 publications

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