Mr. Jishuo Yang Profile

Jishuo Yang

at Shanghai Institute of Optics and Fine Mechanics

SPIE Involvement:

Author

Publications (7)

SPIE Journal Paper | 13 November 2014

In situ aberration measurement method using a phase-shift ring mask

Sikun Li, Xiangzhao Wang, Jishuo Yang, Lifeng Duan, Feng Tang, Guanyong Yan

JM3, Vol. 14, Issue 01, 011005, (November 2014) https://doi.org/10.1117/12.10.1117/1.JMM.14.1.011005

KEYWORDS: Photomasks, In situ metrology, Process modeling, Image processing, Lithography, Principal component analysis, Error analysis, Image retrieval, Semiconducting wafers, Zernike polynomials

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Proceedings Article | 31 March 2014 Paper

A defocus measurement method for an in situ aberration measurement method using a phase-shift ring mask

Sikun Li, Xiangzhao Wang, Jishuo Yang, Feng Tang, Guanyong Yan, Andreas Erdmann

Proceedings Volume 9052, 90521L (2014) https://doi.org/10.1117/12.2046649

KEYWORDS: Photomasks, Image processing, Process modeling, In situ metrology, Lithography, Principal component analysis, Image retrieval, Polarization, Error analysis, Databases

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Proceedings Article | 31 March 2014 Paper

In situ aberration measurement method using a phase-shift ring mask

Xiangzhao Wang, Sikun Li, Jishuo Yang, Feng Tang, Guanyong Yan, Andreas Erdmann

Proceedings Volume 9052, 90521J (2014) https://doi.org/10.1117/12.2046257

KEYWORDS: Photomasks, In situ metrology, Lithography, Principal component analysis, Process modeling, Image processing, Zernike polynomials, Lenses, Image retrieval, Monochromatic aberrations

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SPIE Journal Paper | 11 June 2013

In situ aberration measurement technique based on an aerial image with an optimized source

Guanyong Yan, Xiangzhao Wang, Sikun Li, Jishuo Yang, Dongbo Xu, Lifeng Duan, Anatoly Bourov, Andreas Erdmann

OE, Vol. 52, Issue 06, 063602, (June 2013) https://doi.org/10.1117/12.10.1117/1.OE.52.6.063602

KEYWORDS: In situ metrology, Image processing, Principal component analysis, Process modeling, Lithography, Matrices, Optical engineering, Image retrieval, Lithographic illumination, Zernike polynomials

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SPIE Journal Paper | 7 May 2013

High-order aberration measurement technique based on a quadratic Zernike model with optimized source

Jishuo Yang, Xiangzhao Wang, Sikun Li, Lifeng Duan, Guanyong Yan, Dongbo Xu, Anatoly Bourov, Andreas Erdmann

OE, Vol. 52, Issue 05, 053603, (May 2013) https://doi.org/10.1117/12.10.1117/1.OE.52.5.053603

KEYWORDS: Photomasks, Lithography, Artificial intelligence, Principal component analysis, Optical engineering, Process modeling, Wavefront aberrations, Monochromatic aberrations, Instrument modeling, Mechanics

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Proceedings Article | 18 December 2012 Paper

In situ aberration measurement technique based on quadratic Zernike model

Jishuo Yang, Xiangzhao Wang, Sikun Li, Lifeng Duan, Guanyong Yan, Dongbo Xu, Anatoly Bourov, Andreas Erdmann

Proceedings Volume 8550, 85503O (2012) https://doi.org/10.1117/12.981328

KEYWORDS: Lithography, Principal component analysis, Wavefront aberrations, In situ metrology, Semiconducting wafers, Image processing, Photomasks, Computer simulations, Metrology, Artificial intelligence

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Proceedings Article | 18 December 2012 Paper

In situ aberration measurement technique based on aerial image with optimized source

Guanyong Yan, Xiangzhao Wang, Sikun Li, Jishuo Yang, Dongbo Xu, Lifeng Duan, Anatoly Bourov, Andreas Erdmann

Proceedings Volume 8550, 85503N (2012) https://doi.org/10.1117/12.981334

KEYWORDS: Matrices, Lithographic illumination, Lithography, Image processing, Principal component analysis, Process modeling, Statistical analysis, Error analysis, Artificial intelligence, Imaging systems

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Showing 5 of 7 publications

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