Dr. Jochen Schacht
at Mentor Graphics Taiwan Ltd
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 13 March 2012 Paper
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: SRAF, Optical proximity correction, Logic, Fiber optic illuminators, Printing, Photomasks, Visualization, Lithography, Manufacturing, Resolution enhancement technologies

Proceedings Article | 13 March 2009 Paper
Proc. SPIE. 7275, Design for Manufacturability through Design-Process Integration III
KEYWORDS: Optical proximity correction, Semiconducting wafers, Atrial fibrillation, Photomasks, Autoregressive models, Reticles, Electroluminescence, Lithography, Model-based design, Manufacturing

Proceedings Article | 13 March 2009 Paper
Proc. SPIE. 7275, Design for Manufacturability through Design-Process Integration III
KEYWORDS: Optical proximity correction, Electronic design automation, Photomasks, Semiconducting wafers, Data modeling, SRAF, Visualization, Wafer-level optics, Databases, Lithography

Proceedings Article | 4 December 2008 Paper
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Printing, Optical proximity correction, Model-based design, Critical dimension metrology, Lithography, Optimization (mathematics), Manufacturing, SRAF, Resolution enhancement technologies, Semiconducting wafers

Proceedings Article | 24 March 2008 Paper
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Optical proximity correction, Scanning electron microscopy, Process modeling, Data modeling, Semiconducting wafers, Lithography, Optical lithography, Calibration, Finite element methods, Model-based design

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