Dr. Johannes Ruoff Profile

Dr. Johannes Ruoff

Optical Designer at Carl Zeiss SMT GmbH

SPIE Involvement:

Conference Program Committee | Author

SPIE Journal Paper | 4 October 2018

Rapid evaluation of vignetting-free high-performance systems

Gregory Forbes, Johannes Ruoff

OE Vol. 57 Issue 10

KEYWORDS: Wavefronts, Optical design, Optical engineering, Error analysis, Zernike polynomials, Ray tracing, Statistical analysis, Vignetting, Visualization, Light emitting diodes

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Proceedings Article | 27 November 2017 Paper

Rapid evaluation of high-performance systems

G. Forbes, J. Ruoff

Proc. SPIE. 10590, International Optical Design Conference 2017

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Proceedings Article | 27 September 2016 Paper

Validity of ray trace based performance predictions of optical systems with diffractive optical elements (DOE)

Markus Seesselberg, Bernd Kleemann, Johannes Ruoff

Proc. SPIE. 9953, Optical Modeling and Performance Predictions VIII

KEYWORDS: Diffraction, Refractive index, Diffractive optical elements, Computer generated holography, Refraction, Far-field diffraction, Far-field diffraction, Ray tracing, Geometrical optics, Optical design software, Diffraction gratings

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Proceedings Article | 1 April 2013 Paper

Modeling studies on alternative EUV mask concepts for higher NA

Andreas Erdmann, Tim Fühner, Peter Evanschitzky, Jens Timo Neumann, Johannes Ruoff, Paul Gräupner

Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV

KEYWORDS: Lithography, Multilayers, Silicon, Photomasks, Extreme ultraviolet, Optical proximity correction, Nanoimprint lithography, Molybdenum, Binary data, Image quality standards

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Proceedings Article | 5 April 2011 Paper

AIMS EUV: the actinic aerial image review platform for EUV masks

Dirk Hellweg, Johannes Ruoff, Alois Herkommer, Joachim Stühler, Thomas Ihl, Heiko Feldmann, Michael Ringel, Ulrich Strößner, Sascha Perlitz, Wolfgang Harnisch

Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II

KEYWORDS: Reticles, Scanners, Projection systems, Photomasks, Extreme ultraviolet, Artificial intelligence, Charge-coupled devices, Extreme ultraviolet lithography, Optics manufacturing, EUV optics

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Proceedings Article | 29 September 2010 Paper

Impact of mask topography and multilayer stack on high NA imaging of EUV masks

Johannes Ruoff

Proc. SPIE. 7823, Photomask Technology 2010

KEYWORDS: Diffraction, Apodization, Refractive index, Reticles, Nickel, Reflectivity, Photomasks, Extreme ultraviolet, Bismuth, Critical dimension metrology

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Proceedings Article | 9 September 2010 Paper

Using orientation Zernike polynomials to predict the imaging performance of optical systems with birefringent and partly polarizing components

Johannes Ruoff, Michael Totzeck

Proc. SPIE. 7652, International Optical Design Conference 2010

KEYWORDS: Optical imaging, Optical components, Apodization, Polarization, Imaging systems, Wavefronts, Polarizers, Wave plates, Zernike polynomials, Chemical elements

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Proceedings Article | 20 March 2010 Paper

Actinic review of EUV masks

Heiko Feldmann, Johannes Ruoff, Wolfgang Harnisch, Winfried Kaiser

Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography

KEYWORDS: Mirrors, Metrology, Imaging systems, Scanners, Photons, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Zone plates, EUV optics

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SPIE Journal Paper | 1 July 2009

Orientation Zernike polynomials: a useful way to describe the polarization effects of optical imaging systems

Johannes Ruoff, Michael Totzeck

JM3 Vol. 8 Issue 03

KEYWORDS: Zernike polynomials, Polarization, Wavefronts, Apodization, Wave plates, Resolution enhancement technologies, Polarizers, Lithography, Critical dimension metrology, Imaging systems

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Proceedings Article | 4 December 2008 Paper

Orientation Zernike Polynomials: a systematic description of polarized imaging using high NA lithography lenses

Tilmann Heil, Johannes Ruoff, Jens Timo Neumann, Michael Totzeck, Daniel Krähmer, Bernd Geh, Paul Gräupner

Proc. SPIE. 7140, Lithography Asia 2008

KEYWORDS: Lithography, Diffraction, Apodization, Polarization, Imaging systems, Wavefronts, Zernike polynomials, Process control, Lithographic lenses, Critical dimension metrology

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Proceedings Article | 30 October 2007 Paper

Polarization-induced astigmatism caused by topographic masks

Johannes Ruoff, Jens Timo Neumann, Emil Schmitt-Weaver, Eelco van Setten, Nicolas le Masson, Chris Progler, Bernd Geh

Proc. SPIE. 6730, Photomask Technology 2007

KEYWORDS: Diffraction, Monochromatic aberrations, Reticles, Polarization, Birefringence, Chromium, Photomasks, Electromagnetism, Binary data, Commercial off the shelf technology

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Proceedings Article | 26 March 2007 Paper

The impact of projection lens polarization properties on lithographic process at hyper-NA

Bernd Geh, Johannes Ruoff, Jörg Zimmermann, Paul Gräupner, Michael Totzeck, Markus Mengel, Uwe Hempelmann, Emil Schmitt-Weaver

Proc. SPIE. 6520, Optical Microlithography XX

KEYWORDS: Optical components, Lithography, Apodization, Polarization, Birefringence, Matrices, Polarizers, Wave plates, Optical proximity correction, Resolution enhancement technologies

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Proceedings Article | 14 October 2005 Paper

Optical systems design with integrated rigorous vector diffraction

Bernd Kleemann, Johannes Ruoff, Markus Seeßelberg, Johannes-Maria Kaltenbach, Christoph Menke, Hans-Jürgen Dobschal

Proc. SPIE. 5962, Optical Design and Engineering II

KEYWORDS: Optical components, Diffraction, Point spread functions, Optical design, Holographic optical elements, Diffractive optical elements, Polarization, Ray tracing, Objectives, Diffraction gratings

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SPIE Journal Paper | 1 July 2005

Polarization influence on imaging

Michael Totzeck, Paul Gräupner, Tilmann Heil, Aksel Göhnermeier, Olaf Dittmann, Daniel Kraehmer, Vladimir Kamenov, Johannes Ruoff, Donis Flagello

JM3 Vol. 4 Issue 03

KEYWORDS: Polarization, Diffraction, Wavefronts, Imaging systems, Zernike polynomials, Superposition, Jones vectors, Radio propagation, Birefringence, Lithography

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Proceedings Article | 12 May 2005 Paper

How to describe polarization influence on imaging

M. Totzeck, P. Graupner, T. Heil, A. Gohnermeier, O. Dittmann, D. Krahmer, V. Kamenov, J. Ruoff, D. Flagello

Proc. SPIE. 5754, Optical Microlithography XVIII

KEYWORDS: Superposition, Diffraction, Polarization, Birefringence, Imaging systems, Wavefronts, Wave propagation, Zernike polynomials, Jones vectors, Radio propagation

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Showing 5 of 15 publications

Conference Committee Involvement (2)

Modeling Aspects in Optical Metrology VIII

21 June 2021 | Munich, Germany

Modeling Aspects in Optical Metrology VII

24 June 2019 | Munich, Germany

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