Dr. Johannes F. Tümmler Profile

Dr. Johannes F. Tümmler

Scientist at MBI für Nichtlineare Optik Kurzzeitspektroskopie

SPIE Involvement:

Author

Publications (24)

Proceedings Article | 8 June 2023 Presentation

Presentation

Soft x-ray absorption spectroscopy in the lab using laser-based sources and novel reflection zone-plate optics

Holger Stiel, Julia Braenzel, Matthias Schnuerer, Johannes Tuemmler, Themis Sidiroupolos, Richard Gnewkow, Ioanna Mantouvalou, Christian Seifert, Alexei Erko, Thomas Krist, Lutz Ehrentraut, Marc Dummin

Proceedings Volume 12582, 125820C (2023) https://doi.org/10.1117/12.2665059

KEYWORDS: X-ray optics, X-rays, Zone plates, Absorption spectroscopy, Spectroscopy, X-ray sources, Ultrafast laser spectroscopy, Transition metals, Synchrotrons, Plasmas

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Proceedings Article | 8 July 2021 Open Access

Open Access

Paper

Ultrafast NEXAFS spectroscopy in the lab using laser-based sources and advanced X-ray optics

Holger Stiel, Julia Braenzel, Johannes Tuemmler, Adrian Jonas, Ioanna Mantouvalou, Alexei Erko, Anke Heilmann, Martin Moerbeck-Bock, Matthias Schnuerer

Proceedings Volume 11886, 1188612 (2021) https://doi.org/10.1117/12.2593295

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Proceedings Article | 17 May 2017 Paper

Paper

Soft x-ray nanoscale imaging using highly brilliant laboratory sources and new detector concepts

H. Stiel, J. Braenzel, A. Dehlinger, R. Jung, A. Luebcke, M. Regehly, S. Ritter, J. Tuemmler, M. Schnuerer, C. Seim

Proceedings Volume 10243, 1024309 (2017) https://doi.org/10.1117/12.2264222

KEYWORDS: Sensors, X-ray imaging, X-rays, Spatial resolution, Super resolution, CCD image sensors, Plasma, X-ray lasers, Imaging spectroscopy, Image resolution, X-ray microscopy, Cameras, Zone plates, Microscopes, Reconstruction algorithms

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Proceedings Article | 29 September 2009 Paper

Paper

Research on the seeding of high-energy harmonic pulse into an x-ray lasing medium

Hyung Taek Kim, Chul Min Kim, Karol Adam Janulewicz, Kyung Taec Kim, I Jong Kim, Tae Jun Yu, Seong Ku Lee, Jae Hee Sung, Il Woo Choi, Holger Stiel, Johannes Tümmler, Tomas Mocek, Jaroslav Nejdl, Michaela Kozlová, Jongmin Lee

Proceedings Volume 7451, 74510W (2009) https://doi.org/10.1117/12.825959

KEYWORDS: X-rays, X-ray lasers, Picosecond phenomena, Polarization, Silver, Molybdenum, Pulsed laser operation, Modulation, Neon, Solids

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Proceedings Article | 29 September 2009 Paper

Paper

X-ray laser takes the 100 Hz barrier

Holger Stiel, Johannes Tümmler, Robert Jung, Peter Nickles, Wolfgang Sandner

Proceedings Volume 7451, 745109 (2009) https://doi.org/10.1117/12.826317

KEYWORDS: Optical amplifiers, Picosecond phenomena, X-ray lasers, Imaging spectroscopy, Laser applications, Optical pumping, Pulsed laser operation, Laser systems engineering, Plasma, Disk lasers

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Proceedings Article | 12 October 2007 Paper

Paper

Full characterization of a GRIP Ni-like Ag amplifier for seeding with high harmonics at 13.9 nm

K. Janulewicz, J. Tuemmler, P. Nickles, H. Kim, I. Choi, N. Hafz, C. Kim, H. Kang, J. Sung, T. Yu, K. Hong, T. Jeong, J. Kim, Y.-C. Noh, D.-K. Ko, J. Lee

Proceedings Volume 6702, 67020A (2007) https://doi.org/10.1117/12.734012

KEYWORDS: X-ray lasers, Picosecond phenomena, Silver, Pulsed laser operation, Amplifiers, Near field, Neon, X-rays, Spatial coherence, Laser development

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Proceedings Article | 12 October 2005 Paper

Paper

X-ray lasers pumped by low-energy laser drivers

Karol Janulewicz, Johannes Tümmler, Gerd Priebe, Peter Nickles

Proceedings Volume 5958, 595813 (2005) https://doi.org/10.1117/12.623338

KEYWORDS: X-ray lasers, Plasma, Picosecond phenomena, Pulsed laser operation, Laser development, Ionization, Ions, Laser energy, Visible radiation, Electrons

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Proceedings Article | 14 September 2005 Paper

Paper

X-ray lasers driven by low-energy picosecond laser pulses

Karol Janulewicz, Johannes Tümmler, Gerd Priebe, Peter Nickles

Proceedings Volume 5919, 591906 (2005) https://doi.org/10.1117/12.616829

KEYWORDS: X-ray lasers, Plasma, Picosecond phenomena, Ionization, Pulsed laser operation, Electrons, Laser energy, Laser development, Ions, Amplifiers

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Proceedings Article | 12 September 2005 Paper

Paper

Elements of capillary optics applied in the spectral range between 10 and 15 nm

J. Tümmler, H. Stiel, H. Legall, R. Bruch, A. Bjeoumikhov, N. Langhoff, K. Janulewicz, G. Priebe, P. Nickles

Proceedings Volume 5919, 59190F (2005) https://doi.org/10.1117/12.617053

KEYWORDS: Beam splitters, Capillaries, Extreme ultraviolet, Optical components, Reflectivity, Plasma, Glasses, Charge-coupled devices, X-ray lasers, Zone plates

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SPIE Journal Paper | 1 July 2003

Comparison of extreme ultraviolet reflectance measurements

Frank Scholze, Johannes Tümmler, Eric Gullikson, Andy Aquila

JM3, Vol. 2, Issue 03, (July 2003) https://doi.org/10.1117/12.10.1117/1.1583735

KEYWORDS: Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Mirrors, Monochromators, Krypton, Light scattering, X-ray optics, Spectral resolution, 3D metrology

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Proceedings Article | 16 June 2003 Paper

Paper

Characterization of a laser-produced plasma source for a laboratory EUV reflectometer

Frank Scholze, Frank Scholz, Johannes Tuemmler, Gerhard Ulm, Herbert Legall, Peter-Viktor Nickles, Wolfgang Sandner, Holger Stiel, Ludwig van Loyen

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.482646

KEYWORDS: Extreme ultraviolet, Plasma, Spectroscopy, Mirrors, Pulsed laser operation, Reflectometry, Laser energy, Charge-coupled devices, Calibration, Power meters

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With the development of EUV lithography there is an increasing need for high-accuracy at-wavelength metrology. In particular, there is an urgent need for metrology at optical components like mirrors or masks close to the production line. Sources for metrology have to fit different demands on EUV power and spectral shape than sources for steppers systems. We present the results of the radiometric characterization of a laser produced plasma (LPP)-source, newly developed at Max-Born-Institute Berlin for use in an EUV reflectometer. It is operated with a high-power pointing-stabilized laser beam (energy per pulse up to 700 mJ, 10 ns pulse duration, < ± 25 μrad pointing stability) at 532 nm which is focussed on a rotating Au target cylinder. The incident angle of the laser beam is set to 63°, the detecting angle 55° to the target normal. The source has been characterized regarding spectral photon flux, source size and source point stability. Two independently calibrated instruments, an imaging spectrometer and a double multilayer tool for in-band power measurements were used to obtain highly reliable quantitative values for the EUV emission of the Au-LPP source. Both instruments were calibrated by Physikalisch-Technische Bundesanstalt in its radiometry laboratory at the electron storage ring BESSY II. We obtained a source size of 30 μm by 50 μm (2s horizontal by vertical) and a stability of better than 2s=5 μm horizontally and 2s=9 μm vertically. A spectral photon flux of 1*10e14 /(s sr 0.1 nm) at 13.4 nm at a laser pulse energy of 630 mJ is obtained. The shot-to-shot stability of the source is about 5% (1s) for laser pulse energies above 200 mJ. For pulse energies between 200 mJ and 700 mJ, there is a linear relation between laser pulse energy and EUV output. The spectrum shows a flat continuos emission in the EUV spectral range, which is important for wavelength scanning reflectometry. High stability in total flux and spectral shape of the plasma emission as well as low debris was only obtained using a new target position for each shot. There is also a trade off between source size and EUV power. For a slightly defocused laser, an increase in EUV power up to a factor of two is obtained, while the source size also increases by about a factor of two. It is shown that an Au-LPP source provides spectrally flat reproducible emission with sufficient power at low debris conditions for the operation of a laboratory based EUV reflectometer.

Proceedings Article | 16 June 2003 Paper

Paper

Characterization of the PTB EUV reflectometry facility for large EUVL optical components

Johannes Tummler, Heike Blume, Guido Brandt, Jens Eden, Bernd Meyer, Hartmut Scherr, Frank Scholz, Frank Scholze, Gerhard Ulm

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.482668

KEYWORDS: Reflectometry, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Sensors, Mirrors, Stray light, Diodes, Optical testing, Metrology

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Proceedings Article | 2 June 2003 Paper

Paper

New laboratory EUV reflectometer for large optics using a laser plasma source

Ludwig van Loyen, Thomas Boettger, Stefan Braun, Hermann Mai, Andreas Leson, Frank Scholze, Johannes Tuemmler, Gerhard Ulm, Herbert Legall, Peter Nickles, Wolfgang Sandner, Holger Stiel, Christian Rempel, Mirko Schulze, Joerg Brutscher, Fritz Macco, Stefan Muellender

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.485042

KEYWORDS: Extreme ultraviolet, Reflectivity, Sensors, Reflectometry, Beam splitters, Monochromators, EUV optics, Mirrors, Pulsed laser operation, Signal detection

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Proceedings Article | 28 May 2003 Paper

Paper

Mask CD characterization with EUV reflectometry at the electron storage ring BESSY II

Albrecht Ehrmann, Jenspeter Rau, Andreas Wolter, Frank-Michael Kamm, Josef Mathuni, Frank Scholze, Johannes Tummler, Gerhard Ulm

Proceedings Volume 5148, (2003) https://doi.org/10.1117/12.514961

KEYWORDS: Extreme ultraviolet, Reflectivity, Photomasks, Compact discs, Scanning electron microscopy, Scatterometry, Sensors, Diffraction, Cadmium, Computer simulations

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Proceedings Article | 24 December 2002 Paper

Paper

Irradiation of EUV multilayer optics with synchrotron radiation of a different time structure

Roman Klein, Frank Scholze, R. Thornagel, Johannes Tummler, M. Wedowski, R. Jansen, B. Mertens, A. van de Runstraat, Gerhard Ulm

Proceedings Volume 4782, (2002) https://doi.org/10.1117/12.451352

KEYWORDS: Synchrotron radiation, Reflectivity, Mirrors, Electron beams, Extreme ultraviolet, Extreme ultraviolet lithography, Optical filters, EUV optics, Contamination, Radio optics

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Proceedings Article | 1 July 2002 Paper

Paper

New PTB reflectometer for the characterization of large optics for the extreme ultraviolet spectral region

Johannes Tuemmler, Frank Scholze, Guido Brandt, Bernd Meyer, Frank Scholz, Katrin Vogel, Gerhard Ulm, Michael Poier, Udo Klein, Wolfgang Diete

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472307

KEYWORDS: Reflectometry, Reflectivity, Extreme ultraviolet, Mirrors, EUV optics, Extreme ultraviolet lithography, Sensors, Optical components, Monochromators, X-rays

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Proceedings Article | 1 July 2002 Paper

Paper

High-accuracy detector calibration for EUV metrology at PTB

Frank Scholze, Guido Brandt, Peter Mueller, Bernd Meyer, Frank Scholz, Johannes Tuemmler, Katrin Vogel, Gerhard Ulm

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472342

KEYWORDS: Diodes, Calibration, Sensors, Extreme ultraviolet, Photodiodes, Radiometry, Silicon, Oxides, Cryogenics, X-rays

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With the development of EUV-lithography, high-accuracy at-wavelength metrology has increasingly gained in importance. Characterization of detectors and sources using synchrotron radiation has been performed by the Physikalisch--Technische Bundesanstalt (PTB) for almost 20 years. At their new laboratory at BESSY II, PTB now has set up instrumentation which is suitable for high-accuracy EUV detector calibration. It uses synchrotron radiation from a bending magnet for detector characterization at a plane grating monochromator beamline. The detector calibration at PTB uses a cryogenic electrical substitution radiometer as the primary detector standard. For the measurement of radiant power of about 1 (mu) W, the systematic uncertainty contributions from the electrical substitution principle of about 0.03 percent relative dominate the measurement uncertainty of the radiometer. Careful adjustment of the temperature control circuit reduced the statistical noise of the measured power to about 0.2 nW. This allows the radiant power to be measured down to 0.1(mu) W with an uncertainty of 0.3 percent or better. This uncertainty is lower than the results achieved elsewhere by more than one order of magnitude. In this paper, the current status of EUV detector calibration at PTB is presented. The high performance of the radiometer, together with the improved stability and spectral purity of the beamline, is illustrated by typical results. In the EUV spectral range, photodiodes can be calibrated with a relative uncertainty of about 0.3 percent. This low uncertainty permits systematic studies of the homogeneity and stability of detectors with unprecedented sensitivity for even minor changes. The responsivity of individual photodiodes has been observed over a period of up to six years. We present a first investigation of the long-term stability of AXUV photodiodes which are widely assumed to be stable in the EUV spectral range. The results are of sufficient accuracy to show that even diodes which are rarely used and carefully stored, degrade. After a period of three years, the degradation becomes ever stronger.

Proceedings Article | 7 January 2002 Paper

Paper

Tomography with high resolution

Christoph Rau, Timm Weitkamp, Anatoly Snigirev, Christian Schroer, Boris Benner, Johannes Tuemmler, Til Guenzler, Marion Kuhlmann, Bruno Lengeler, Carl Krill, K. Doebrich, Daniel Michels, Andreas Michels

Proceedings Volume 4503, (2002) https://doi.org/10.1117/12.452849

KEYWORDS: Tomography, X-rays, Mirrors, Aluminum, Silicon, Hard x-rays, Palladium, X-ray imaging, Spatial resolution, Sensors

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Proceedings Article | 20 December 2001 Paper

Paper

Lifetime testing of EUV optics using intense synchrotron radiation at the PTB Radiometry Laboratory

Roman Klein, Alexander Gottwald, Frank Scholze, R. Thornagel, Johannes Tuemmler, Gerhard Ulm, Marco Wedowski, Frank Stietz, Bas Mertens, Norbert Koster, J. van Elp

Proceedings Volume 4506, (2001) https://doi.org/10.1117/12.450950

KEYWORDS: Mirrors, Reflectivity, Extreme ultraviolet, EUV optics, Optical filters, Extreme ultraviolet lithography, Synchrotron radiation, Radiometry, Lithography, Reflectometry

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Proceedings Article | 22 August 2001 Paper

Paper

High-accuracy EUV metrology of PTB using synchrotron radiation

Frank Scholze, Burkhard Beckhoff, G. Brandt, R. Fliegauf, Alexander Gottwald, Roman Klein, Bernd Meyer, U. Schwarz, R. Thornagel, Johannes Tuemmler, Klaus Vogel, J. Weser, Gerhard Ulm

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436766

KEYWORDS: Mirrors, Extreme ultraviolet, Metrology, Monochromators, Reflectometry, Sensors, Diffraction, Radiometry, Reflectivity, Optical filters

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Proceedings Article | 25 January 2001 Paper

Paper

Compound refractive lenses: high-quality imaging optics for the X-FEL

Christian Schroer, Johannes Tuemmler, Bruno Lengeler, Michael Drakopoulos, Anatoly Snigirev, Irina Snigireva

Proceedings Volume 4143, (2001) https://doi.org/10.1117/12.413680

KEYWORDS: Lenses, Aluminum, Beryllium, X-ray optics, Free electron lasers, Diffraction, X-rays, Nickel, Hard x-rays, Visible radiation

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Proceedings Article | 5 January 2001 Paper

Paper

Parabolic compound refractive lenses for hard x rays

Christian Schroer, Bruno Lengeler, Boris Benner, Marion Kuhlmann, Til Guenzler, Johannes Tuemmler, Christoph Rau, Timm Weitkamp, Anatoly Snigirev, Irina Snigireva

Proceedings Volume 4145, (2001) https://doi.org/10.1117/12.411647

KEYWORDS: Lenses, Aluminum, X-rays, Hard x-rays, Beryllium, Microscopy, Microscopes, Absorption, Synchrotrons, Tomography

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Proceedings Article | 18 December 2000 Paper

Paper

Fluorescence microtomography: external mapping of elements inside biological samples

Christian Schroer, Johannes Tuemmler, Til Guenzler, Bruno Lengeler, Walter Schroeder, Arnd Kuhn, Alexandre Simionovici, Anatoly Snigirev, Irina Snigireva

Proceedings Volume 4142, (2000) https://doi.org/10.1117/12.410573

KEYWORDS: Luminescence, Chemical elements, Absorption, Sensors, Potassium, Lenses, Tomography, X-ray fluorescence spectroscopy, Hard x-rays, Signal detection

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Proceedings Article | 11 December 1997 Paper

Paper

Refractive lenses for high-energy x-ray focusing

Anatoly Snigirev, B. Filseth, Pascal Elleaume, Th. Klocke, Victor Kohn, Bruno Lengeler, Irina Snigireva, Alexei Souvorov, Johannes Tuemmler

Proceedings Volume 3151, (1997) https://doi.org/10.1117/12.294496

KEYWORDS: Lenses, X-rays, Beryllium, Absorption, Refraction, Diagnostics, Aluminum, Boron, Monochromators, Hard x-rays

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Showing 5 of 24 publications

Conference Committee Involvement (1)

Diode-Pumped High Energy and High Power Lasers

18 April 2011 | Prague, Czech Republic

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