Dr. John C. Arnold
at IBM Research
SPIE Involvement:
Conference Program Committee | Author
Publications (37)

Proceedings Article | 24 March 2020 Presentation
Proc. SPIE. 11326, Advances in Patterning Materials and Processes XXXVII

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
KEYWORDS: Lithography, Optical lithography, Etching, Metals, Directed self assembly, Critical dimension metrology, Overlay metrology, Back end of line

SPIE Journal Paper | 5 September 2018
JM3 Vol. 18 Issue 01
KEYWORDS: Inspection, Semiconducting wafers, Stochastic processes, Extreme ultraviolet, Etching, Defect detection, Electron beam lithography, Modulation, Coating, Extreme ultraviolet lithography

SPIE Journal Paper | 31 July 2018
JM3 Vol. 18 Issue 01
KEYWORDS: Etching, Extreme ultraviolet, Line edge roughness, Optical lithography, Line width roughness, Silicon, Double patterning technology, Dielectrics, Metals, System on a chip

Proceedings Article | 9 April 2018 Paper
Proc. SPIE. 10589, Advanced Etch Technology for Nanopatterning VII
KEYWORDS: Optical lithography, Etching, Extreme ultraviolet, Line width roughness, Plasma etching, Extreme ultraviolet lithography, Deposition processes, Line edge roughness, Photoresist processing, Plasma

Showing 5 of 37 publications
Conference Committee Involvement (2)
Advanced Etch Technology and Process Integration for Nanopatterning X
22 February 2021 | Online Only, California, United States
Advanced Etch Technology for Nanopatterning IX
25 February 2020 | San Jose, California, United States
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