Dr. John J. Biafore
Research Scientist at KLA Texas
SPIE Involvement:
Author
Publications (72)

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Computer simulations, Extreme ultraviolet lithography, Optical proximity correction, Failure analysis, Stochastic processes, Model-based design

Proceedings Article | 7 November 2018 Presentation
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Lithography, Metrology, Etching, Surface roughness, Photoresist materials, Speckle pattern, Photomasks, Extreme ultraviolet lithography, Line edge roughness, Mass attenuation coefficient

Proceedings Article | 3 October 2018 Presentation + Paper
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Optical lithography, Calibration, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing, Stochastic processes

Proceedings Article | 19 March 2018 Paper
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Lithography, Computer simulations, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Stochastic processes, Chemically amplified resists

Proceedings Article | 19 March 2018 Presentation + Paper
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Calibration, Metals, Photoresist materials, Monte Carlo methods, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Stochastic processes, Edge roughness, Absorption

Showing 5 of 72 publications
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