Dr. John A. Hoffnagle Profile

Dr. John A. Hoffnagle

Research Scientist at Picarro Inc

SPIE Involvement:

Author | Instructor

Area of Expertise:

Atomic and molecular spectroscopy , Laser beam shaping , Geometrical optics

Websites:

Company Website

Publications (34)

Proceedings Article | 12 May 2016 Paper

Portable low power cavity ring-down spectrometer for precise measurement of carbon dioxide, methane and water vapor

Derek Fleck, John Hoffnagle, Sze Tan, Yonggang He

Proceedings Volume 9855, 98550H (2016) https://doi.org/10.1117/12.2229642

KEYWORDS: Spectroscopy, Methane, Absorption, Gases, Carbon dioxide, Calibration, Microsoft Foundation Class Library, Switches, Temperature metrology, Sensors

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Proceedings Article | 15 October 2012 Paper

Review: design and analysis of plano-aspheric laser beam shapers

David Shealy, John Hoffnagle

Proceedings Volume 8490, 849003 (2012) https://doi.org/10.1117/12.945872

KEYWORDS: Wavefronts, Beam shaping, Aspheric lenses, Gaussian beams, Geometrical optics, Ray tracing, Refraction, Wave propagation, CCD image sensors, Optical design

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Proceedings Article | 15 October 2012 Paper

Optical and mechanical tolerances for two-lens plano-aspheric laser beam shapers

John Hoffnagle, David Shealy

Proceedings Volume 8490, 849004 (2012) https://doi.org/10.1117/12.945877

KEYWORDS: Beam shaping, Wavefronts, Tolerancing, Collimation, Geometrical optics, Laser systems engineering, Optical components, Aspheric lenses, Optical alignment, Monochromatic aberrations

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Proceedings Article | 16 March 2009 Paper

Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process

Kafai Lai, Alan Rosenbluth, Saeed Bagheri, John Hoffnagle, Kehan Tian, David Melville, Jaione Tirapu-Azpiroz, Moutaz Fakhry, Young Kim, Scott Halle, Greg McIntyre, Alfred Wagner, Geoffrey Burr, Martin Burkhardt, Daniel Corliss, Emily Gallagher, Tom Faure, Michael Hibbs, Donis Flagello, Joerg Zimmermann, Bernhard Kneer, Frank Rohmund, Frank Hartung, Christoph Hennerkes, Manfred Maul, Robert Kazinczi, Andre Engelen, Rene Carpaij, Remco Groenendijk, Joost Hageman, Carsten Russ

Proceedings Volume 7274, 72740A (2009) https://doi.org/10.1117/12.814680

KEYWORDS: Photomasks, Source mask optimization, Diffractive optical elements, Manufacturing, Lithographic illumination, Lithography, Semiconducting wafers, Photovoltaics, Polarization, Printing

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Proceedings Article | 29 August 2008 Paper

Wavefront generated by reflection of a plane wave from a conic section

John Hoffnagle, David Shealy

Proceedings Volume 7060, 70600V (2008) https://doi.org/10.1117/12.796515

KEYWORDS: Wavefronts, Reflection, Geometrical optics, Mirrors, Chromium, Light wave propagation, Refraction, Off axis mirrors, Aspheric lenses, Reflectors

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Proceedings Article | 26 September 2007 Paper

Caustic surfaces in a Keplerian two-lens beam shaper

John Hoffnagle, David Shealy

Proceedings Volume 6663, 666304 (2007) https://doi.org/10.1117/12.737016

KEYWORDS: Beam shaping, Geometrical optics, Ray tracing, Lenses, Aspheric lenses, Diffraction, CCD cameras, CCD image sensors, Charge-coupled devices, Solids

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Proceedings Article | 14 September 2007 Paper

Wavefront and caustic surfaces of refractive laser beam shaper

David Shealy, John Hoffnagle

Proceedings Volume 6668, 666805 (2007) https://doi.org/10.1117/12.737017

KEYWORDS: Wavefronts, Aspheric lenses, Beam shaping, Ray tracing, Wave propagation, Gaussian beams, Refraction, Geometrical optics, Beam propagation method, Optical components

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Proceedings Article | 26 March 2007 Paper

A solid-state 193-nm laser with high spatial coherence for sub-40-nm interferometric immersion lithography

Andrew Merriam, Donald Bethune, John Hoffnagle, William Hinsberg, C. Michael Jefferson, James Jacob, Timothy Litvin

Proceedings Volume 6520, 65202Z (2007) https://doi.org/10.1117/12.712210

KEYWORDS: Semiconducting wafers, Interferometry, Visibility, Solid state lasers, Immersion lithography, Laser sources, Photoresist materials, Prisms, Interferometers, Lithography

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Proceedings Article | 12 September 2006 Paper

Optical system for variable resizing of round flat-top distributions

George Nemeş, John Hoffnagle

Proceedings Volume 6290, 629008 (2006) https://doi.org/10.1117/12.682815

KEYWORDS: Gaussian beams, Spherical lenses, Collimation, Zoom lenses, Optical components, Beam shaping, Cylindrical lenses, Lenses, CCD cameras, Charge-coupled devices

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Proceedings Article | 9 September 2006 Paper

Analytic beam shaping for flattened output irradiance profile

David Shealy, John Hoffnagle, Karl-Heinz Brenner

Proceedings Volume 6290, 629006 (2006) https://doi.org/10.1117/12.681114

KEYWORDS: Beam shaping, Seaborgium, Ray tracing, Beam analyzers, Gaussian beams, Beam propagation method, Geometrical optics, Aspheric lenses, Stereolithography, Analytical research

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Proceedings Article | 30 August 2005 Paper

A new derivation of the Dickey-Romero-Holswade phase function

John Hoffnagle

Proceedings Volume 5876, 587606 (2005) https://doi.org/10.1117/12.620644

KEYWORDS: Beam shaping, Geometrical optics, Chemical elements, Aspheric lenses, Transform theory, Optical components, Paraxial approximations, Collimation, Fourier transforms, Differential equations

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Proceedings Article | 23 August 2005 Paper

Beam shaping profiles and propagation

David Shealy, John Hoffnagle

Proceedings Volume 5876, 58760D (2005) https://doi.org/10.1117/12.619305

KEYWORDS: Beam shaping, Beam propagation method, Diffraction, Aspheric lenses, Seaborgium, Laser beam propagation, Stereolithography, Gaussian beams, Distortion, Lenses

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Proceedings Article | 18 August 2005 Paper

Effects of dispersion on the performance of a refractive beam shaper

John Hoffnagle, David Shealy

Proceedings Volume 5876, 58760G (2005) https://doi.org/10.1117/12.613378

KEYWORDS: Beam shaping, Wavefronts, Collimation, Geometrical optics, Lens design, Aspheric lenses, Paraxial approximations, Transform theory, Wavefront aberrations, Refraction

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Proceedings Article | 4 May 2005 Paper

Evaluation of functional properties of imaging materials for water immersion lithography

William Hinsberg, J. Hoffnagle, G. Wallraff, C. Larson, F. Houle, Linda Sundberg, Hoa Truong, Blake Davis, Robert Allen

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600560

KEYWORDS: Lithography, Water, Polymers, Liquids, Contamination, Reflectivity, Interferometry, Immersion lithography, Semiconducting wafers, Chemical analysis

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Proceedings Article | 4 May 2005 Paper

Studies of acid diffusion in low Ea chemically amplified photoresists

G. Wallraff, D. Medeiros, C. Larson, M. Sanchez, Karen Petrillo, Wu-Song Huang, C. Rettner, B. Davis, Linda Sundberg, William Hinsberg, F. Houle, J. Hoffnagle, Dario Goldfarb, K. Temple, J. Bucchignano

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.601759

KEYWORDS: Diffusion, Absorption, Photoresist materials, Polymers, Humidity, Lithography, Extreme ultraviolet lithography, Image resolution, Infrared imaging, Photoresist processing

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Proceedings Article | 28 May 2004 Paper

Fast calculation of images for high numerical aperture lithography

Alan Rosenbluth, Gregg Gallatin, Ronald Gordon, William Hinsberg, John Hoffnagle, Frances Houle, Kafai Lai, Alexey Lvov, Martha Sanchez, Nakgeuon Seong

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537716

KEYWORDS: Polarization, Photomasks, Diffraction, Birefringence, System on a chip, Lithography, Optical proximity correction, Image processing, Modulation transfer functions, Thin films

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Proceedings Article | 14 May 2004 Paper

Liquid immersion lithography: evaluation of resist issues

William Hinsberg, Gregory Wallraff, Carl Larson, Blake Davis, Vaughn Deline, Simone Raoux, Dolores Miller, Frances Houle, John Hoffnagle, Martha Sanchez, Charles Rettner, Linda Sundberg, David Medeiros, Ralph Dammel, Willard Conley

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536576

KEYWORDS: Liquids, Polymers, Diffusion, Lithography, Immersion lithography, Polymer thin films, Imaging systems, Neodymium, Semiconducting wafers, Absorption

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Proceedings Article | 3 November 2003 Paper

An achromatic refractive laser beam reshaper

C. Jefferson, John Hoffnagle

Proceedings Volume 5175, (2003) https://doi.org/10.1117/12.511304

KEYWORDS: Aspheric lenses, Wavefronts, Silica, Glasses, Lens design, Collimation, Diffraction, Optical components, Telescopes, Chemical elements

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SPIE Journal Paper | 1 November 2003

Beam shaping with a plano-aspheric lens pair

John Hoffnagle, C. Michael Jefferson

OE, Vol. 42, Issue 11, (November 2003) https://doi.org/10.1117/12.10.1117/1.1613957

KEYWORDS: Beam shaping, Beam propagation method, Aspheric lenses, Collimation, Geometrical optics, Gaussian beams, Wavefronts, Wave propagation, Ray tracing, Ultraviolet radiation

Proceedings Article | 12 June 2003 Paper

Extendibility of chemically amplified resists: another brick wall?

William Hinsberg, Frances Houle, Martha Sanchez, John Hoffnagle, Gregory Wallraff, David Medeiros, Gregg Gallatin, Jonathan Cobb

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.487739

KEYWORDS: Lithography, Image resolution, Polymers, Diffusion, Semiconductors, Photoresist processing, Image processing, Chemically amplified resists, Line edge roughness, Molecules

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Proceedings Article | 2 June 2003 Paper

Characterization of photoresist spatial resolution by interferometric lithography

John Hoffnagle, William Hinsberg, Frances Houle, Martha Sanchez

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.485015

KEYWORDS: Modulation transfer functions, Photoresist materials, Interferometry, Spatial resolution, Lithography, Modulation, Spatial frequencies, Deep ultraviolet, Photoresist developing, Optical lithography

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Proceedings Article | 24 October 2002 Paper

Sensitivity of a refractive beam reshaper to figure error

John Hoffnagle

Proceedings Volume 4770, (2002) https://doi.org/10.1117/12.451641

KEYWORDS: Geometrical optics, Tolerancing, Surface finishing, Aspheric lenses, Polishing, Beam shaping, Wavefronts, Collimation, Paraxial approximations, Ray tracing

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SPIE Journal Paper | 1 October 2002

High numerical aperture lithographic imagery at Brewster's angle

Timothy Brunner, Nakgeuon Seong, William Hinsberg, John Hoffnagle, Frances Houle, Martha Sanchez

JM3, Vol. 1, Issue 03, (October 2002) https://doi.org/10.1117/12.10.1117/1.1507337

KEYWORDS: Lithography, Polarization, Photoresist processing, Image processing, Reflectivity, Interferometry, Reflection, Photoresist materials, Semiconducting wafers, Optics manufacturing

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Proceedings Article | 30 July 2002 Paper

High-NA lithographic imagery at Brewster's angle

Timothy Brunner, Nakgeuon Seong, William Hinsberg, John Hoffnagle, Frances Houle, Martha Sanchez

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474473

KEYWORDS: Polarization, Lithography, Reflectivity, Photoresist processing, Reflection, Interferometry, Image processing, Photoresist materials, Optics manufacturing, Semiconducting wafers

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Proceedings Article | 24 July 2002 Paper

High numerical aperture: imaging implications for chemically amplified photoresists

Martha Sanchez, Frances Houle, John Hoffnagle, Timothy Brunner, William Hinsberg

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474233

KEYWORDS: Polarization, Scanning electron microscopy, Lithography, Photoresist materials, Interferometry, Systems modeling, Imaging spectroscopy, Electron microscopes, Antireflective coatings, Image acquisition

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Proceedings Article | 23 January 2002 Paper

Progress in read-write fast-access volume holographic data storage

Geoffrey Burr, Erwin Mecher, Thorsten Juchem, Hans Coufal, C. Michael Jefferson, Mark Jurich, Francisco Gallego, Klaus Meerholz, Norbert Hampp, John Hoffnagle, Roger Macfarlane, Robert Shelby

Proceedings Volume 4459, (2002) https://doi.org/10.1117/12.454035

KEYWORDS: Holograms, Holography, Data storage, Phase conjugation, Spatial light modulators, Crystals, Multiplexing, Volume holography, Lithium niobate, Detector arrays

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Proceedings Article | 30 October 2001 Paper

Measured performance of a refractive Gauss-to-flattop reshaper for deep-UV through near-IR wavelengths

John Hoffnagle, C. Michael Jefferson

Proceedings Volume 4443, (2001) https://doi.org/10.1117/12.446742

KEYWORDS: Aspheric lenses, Beam propagation method, Collimation, Lenses, Gaussian beams, Beam shaping, Ultraviolet radiation, CCD image sensors, Wavefronts, Deep ultraviolet

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Proceedings Article | 19 October 2000 Paper

Multiplexed phase-conjugate holographic storage using an intermediate buffer hologram

Geoffrey Burr, Hans Coufal, John Hoffnagle, C. Michael Jefferson, Mark Jurich, Roger Macfarlane, Robert Shelby

Proceedings Volume 4110, (2000) https://doi.org/10.1117/12.404771

KEYWORDS: Holograms, Phase conjugation, Multiplexing, Tin, Holography, Crystals, Spatial light modulators, Data storage, Laser crystals, Detector arrays

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Proceedings Article | 23 June 2000 Paper

Effect of resist components on image spreading during postexposure bake of chemically amplified resists

William Hinsberg, Frances Houle, Martha Sanchez, Michael Morrison, Gregory Wallraff, Carl Larson, John Hoffnagle, Phillip Brock, Gregory Breyta

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388294

KEYWORDS: Diffusion, Polymers, Chemistry, Photoresist processing, Image processing, Chemically amplified resists, Temperature metrology, Polymer thin films, Chemical analysis, Lithography

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Proceedings Article | 23 June 2000 Paper

Real-time analysis of volatiles formed during processing of a chemically amplified resist

Frances Houle, G. Poliskie, William Hinsberg, Dean Pearson, Martha Sanchez, Hiroshi Ito, John Hoffnagle

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388301

KEYWORDS: Ions, Polymers, Chemical analysis, Chemistry, Ionization, Spectroscopy, Molecules, Mass spectrometry, Nitrogen, Chemically amplified resists

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Proceedings Article | 11 June 1999 Paper

Aerial image contrast using interferometric lithography: effect on line-edge roughness

Martha Sanchez, William Hinsberg, Frances Houle, John Hoffnagle, Hiroshi Ito, Cattien Nguyen

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350198

KEYWORDS: Line edge roughness, Lithography, Polymers, Interferometry, Photoresist materials, Scanning electron microscopy, Image analysis, Semiconducting wafers, Chemistry, Modulation

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Proceedings Article | 11 June 1999 Paper

Experimental method for quantifying acid diffusion in chemically amplified resists

Gregory Wallraff, William Hinsberg, Frances Houle, Mons Morrison, Carl Larson, Martha Sanchez, John Hoffnagle, Phillip Brock, Gregory Breyta

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350196

KEYWORDS: Diffusion, Polymers, Polymer thin films, Image processing, Chemistry, Chemically amplified resists, Systems modeling, Quantum efficiency, Semiconducting wafers, 3D image processing

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Proceedings Article | 5 November 1998 Paper

Optimizing the holographic digital data storage channel

Geoffrey Burr, Jonathan Ashley, Brian Marcus, C. Michael Jefferson, John Hoffnagle, Hans Coufal

Proceedings Volume 3468, (1998) https://doi.org/10.1117/12.330403

KEYWORDS: Holograms, Data storage, Holography, Signal to noise ratio, Digital holography, Spatial light modulators, Diffraction, Modulation, Sensors, Binary data

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Proceedings Article | 23 October 1998 Paper

Figure of merit for the optical aperture used in digital volume holographic data storage

Venkatesh Vadde, Bhagavatula Vijaya Kumar, Geoffrey Burr, Hans Coufal, John Hoffnagle, C. Michael Jefferson

Proceedings Volume 3401, (1998) https://doi.org/10.1117/12.327923

KEYWORDS: Spatial light modulators, Charge-coupled devices, Point spread functions, Holography, Signal to noise ratio, Data storage, Fourier transforms, Digital holography, Holograms, Volume holography

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Showing 5 of 34 publications

Conference Committee Involvement (8)

Laser Beam Shaping XI

2 August 2010 | San Diego, California, United States

Laser Beam Shaping X

3 August 2009 | San Diego, California, United States

Laser Beam Shaping IX

11 August 2008 | San Diego, California, United States

Laser Beam Shaping VIII

28 August 2007 | San Diego, California, United States

Laser Beam Shaping VII

13 August 2006 | San Diego, California, United States

Showing 5 of 8 Conference Committees

Course Instructor

SC565: Introduction to Refractive Laser Beam Shaping Optics

This course covers the design and use of refractive optics to transform the transverse intensity profile of a laser beam. Typically, beam shaping is used to convert the Gaussian profile emitted by a stable resonator or single-mode fiber to a more uniform, flat-top profile, but the formalism used is general enough to accomodate other profile transformations as well. The course describes the advantages of beam shaping and presents an overview of the many possible methods to perform the intensity profile transformation. It procedes to a detailed study of refractive beam shaping, including the choice of a suitable output intensity profile, limitations on beam shaping imposed by diffraction, and the calculation of the necessary aspheric refractive surfaces. Finally, we discuss practical issues pertaining to the use of beam shaping optics, such as input beam preparation, alignment of the beam shaping elements, diagnostics, propagation effects, dispersion, and the resizing and relaying of the output beam.

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