John C. Lam
Senior Member of the Technical Staff at n&k Technology Inc
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 17 October 2008 Paper
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Diffraction, Metrology, Etching, Quartz, Scanning electron microscopy, Scatterometry, Photomasks, Phase measurement, Critical dimension metrology, Phase shifts

Proceedings Article | 2 May 2008 Paper
Proc. SPIE. 6792, 24th European Mask and Lithography Conference
KEYWORDS: Visible radiation, Metrology, Lamps, Reflectivity, Nondestructive evaluation, Scatterometry, Transmittance, Photomasks, Spectrophotometry, Light

Proceedings Article | 1 November 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Metrology, Data modeling, Scatterometry, Numerical analysis, Photomasks, Feedback loops, Critical dimension metrology, Scatter measurement, Data corrections, Systems modeling

Proceedings Article | 30 October 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Signal to noise ratio, Diffraction, Optical properties, Matrices, Inspection, Reflectivity, Scatterometry, Transmittance, Photomasks, Critical dimension metrology

Proceedings Article | 14 May 2007 Paper
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Signal to noise ratio, Dispersion, Quartz, Photons, Reflectivity, Optical testing, Scatterometry, Transmittance, Critical dimension metrology, Scatter measurement

Showing 5 of 11 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top