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John Tsai
at Synopsys Inc
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Publications (1)
Proceedings Article | 23 March 2020 Paper
EUV OPC methodology for beyond 20nm memory cell by simulation data
Jiunhau Fu, Chiang Lin Shih, Chun Cheng Liao, Eric Huang, Elsley Tan, John Tsai, Ming Yun Chen, Yuan Pin Liao, Seung Hee Baek
Proceedings Volume 11323, 113232H (2020) https://doi.org/10.1117/12.2551669
KEYWORDS: Optical proximity correction, Extreme ultraviolet, Molybdenum, Photomasks, Data modeling, Critical dimension metrology, Source mask optimization, Semiconducting wafers, EUV optics, Array processing
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