Mr. John M. Whittey Profile

John M. Whittey

Business Development Manager at Vistec Electron Beam GmbH

SPIE Involvement:

Author

Area of Expertise:

Scanning Electron Microscopy , Metrology , Semiconductor equipment , E-beam Lithography , Photomasks , Wafer Fabs

Publications (16)

Proceedings Article | 8 November 2012 Paper

Photomask film degradation effects in the wafer fab: how to detect and monitor over time

John Whittey, Carl Hess, Edgardo Garcia, Mark Wagner, Brian Duffy

Proc. SPIE. 8522, Photomask Technology 2012

KEYWORDS: Semiconductors, Reticles, Metrology, Manufacturing, Inspection, Signal processing, Process control, Photomasks, Critical dimension metrology, Semiconducting wafers

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Proceedings Article | 8 November 2012 Paper

Comparison of critical dimension measurements of a mask inspection system with a CD-SEM

Jan Heumann, Albrecht Ullrich, Clemens Utzny, Stefan Meusemann, Frank Kromer, John Whittey, Edgardo Garcia, Mark Wagner, Norbert Schmidt

Proc. SPIE. 8522, Photomask Technology 2012

KEYWORDS: Opacity, Manufacturing, Inspection, Electron microscopes, Optical testing, Scanning electron microscopy, Photomasks, Critical dimension metrology, Semiconducting wafers, Wafer manufacturing

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Proceedings Article | 2 April 2010 Paper

In-depth overlay contribution analysis of a poly-layer reticle

Frank Laske, J. Whittey, K.-D. Roeth, J. McCormack, D. Adam, J. Bender, C. Berglund, M. Takac, Seurien Chou

Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV

KEYWORDS: Reticles, Metrology, Spatial frequencies, Error analysis, Manufacturing, Image registration, Photomasks, Semiconducting wafers, Overlay metrology, Data analysis

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Proceedings Article | 23 September 2009 Paper

Experimental test results of pattern placement metrology on photomasks with laser illumination source designed to address double patterning lithography challenges

Klaus-Dieter Roeth, Frank Laske, Michael Heiden, Dieter Adam, Lidia Parisoli, Slawomir Czerkas, John Whittey, Karl-Heinrich Schmidt

Proc. SPIE. 7488, Photomask Technology 2009

KEYWORDS: Lithography, Reticles, Metrology, Lithographic illumination, Deep ultraviolet, Laser development, Image registration, Pellicles, Photomasks, Double patterning technology

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Proceedings Article | 23 September 2009 Paper

Measurement sampling frequency impact on determining magnitude of pattern placement errors on photomasks

J. Whittey, F. Laske, K.-D. Roeth, J. McCormack, D. Adam, J. Bender, C. N. Berglund, M. Takac, Seurien Chou

Proc. SPIE. 7488, Photomask Technology 2009

KEYWORDS: Reticles, Metrology, Statistical analysis, Calibration, Error analysis, Manufacturing, Image registration, Photomasks, Semiconducting wafers, Data analysis

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Proceedings Article | 20 October 2006 Paper

A new algorithm for SEM critical dimension measurements for differentiating between lines and spaces in dense line/space patterns without tone dependence

J. Matsumoto, Y. Ogiso, M. Sekine, T. Iwai, J. Whittey

Proc. SPIE. 6349, Photomask Technology 2006

KEYWORDS: Detection and tracking algorithms, Pattern recognition, Reflectivity, Scanning electron microscopy, Photomasks, Optical simulations, Beam shaping, Optical alignment, Critical dimension metrology, Algorithm development

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Proceedings Article | 6 December 2004 Paper

Reticle CD-SEM for 65-nm technology node and beyond

Gerhard Schlueter, Takayuki Nakamura, Jun Matsumoto, Masahiro Seyama, John Whittey

Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Electron beams, Reticles, Metrology, Contamination, Microsystems, Opacity, Manufacturing, Scanning electron microscopy, Photomasks, Critical dimension metrology

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Proceedings Article | 2 June 2004 Paper

Measurement results on after-etch resist coated features on the new Leica Microsystems' LWM270 DUV critical dimension metrology system

John Whittey, Walter Steinberg

Proc. SPIE. 5504, 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents

KEYWORDS: Microsystems, Deep ultraviolet, Etching, Ultraviolet radiation, Manufacturing, Inspection, Optical testing, Photomasks, Integrated circuits, Critical dimension metrology

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Proceedings Article | 27 December 2002 Paper

Back to square 9: a demonstration of 9-in. reticle capablilty

Kevin Cummings, Ludger Schneider-Stoermann, Ute Buttgereit, Mathias Irmscher, Dietmar Mueller, Peter Hudek, Dirk Beyer, Bernd Brendel, John Whittey, Benjamin Eynon, Jason Harsch, Chris Constantine, Kirk Miller

Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology

KEYWORDS: Lithography, Reticles, Metrology, Manufacturing, Chromium, Scanning electron microscopy, Photomasks, Critical dimension metrology, Semiconducting wafers, Standards development

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Proceedings Article | 11 March 2002 Paper

Performance data of a new 248-nm CD metrology tool proved on COG reticles and PSMs

Gerhard Schlueter, Walter Steinberg, John Whittey

Proc. SPIE. 4562, 21st Annual BACUS Symposium on Photomask Technology

KEYWORDS: Reticles, Electronics, Microsystems, Deep ultraviolet, Ultraviolet radiation, Lens design, Optical testing, Objectives, Optical resolution, Critical dimension metrology

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Proceedings Article | 11 March 2002 Paper

First performance data obtained on next-generation mask metrology tool

Gerhard Schlueter, Klaus-Dieter Roeth, John Whittey

Proc. SPIE. 4562, 21st Annual BACUS Symposium on Photomask Technology

KEYWORDS: Wafer-level optics, Metrology, Microsystems, Fiber optics, Optical testing, Time metrology, Photomasks, Critical dimension metrology, Tolerancing, Fiber optics tests

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Proceedings Article | 18 December 1998 Paper

Stage Cartesian self-calibration: a second method

Michael Takac, John Whittey

Proc. SPIE. 3546, 18th Annual BACUS Symposium on Photomask Technology and Management

KEYWORDS: Lithography, Metrology, Optical lithography, Interferometers, Calibration, Manufacturing, Inspection, Photomasks, Yield improvement, Photomask technology

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Proceedings Article | 18 December 1998 Paper

LWM 200 CD metrology tool evaluation

Robert Uitz, John Whittey

Proc. SPIE. 3546, 18th Annual BACUS Symposium on Photomask Technology and Management

KEYWORDS: Human-machine interfaces, Metrology, Microsystems, Cadmium, Reliability, Time metrology, Critical dimension metrology, Vibration isolation, Tolerancing, Laser systems engineering

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Proceedings Article | 27 December 1996 Paper

Performance data obtained on a new mask metrology tool

Klaus-Dieter Roeth, Carola Blaesing-Bangert, John Whittey

Proc. SPIE. 2884, 16th Annual BACUS Symposium on Photomask Technology and Management

KEYWORDS: Reticles, Edge detection, Metrology, Interferometers, Image analysis, CCD cameras, Photomasks, Semiconducting wafers, Overlay metrology, Laser systems engineering

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Proceedings Article | 15 February 1994 Paper

Improvements in two-dimensional X/Y metrology on photomasks and wafers

John Whittey

Proc. SPIE. 2087, 13th Annual BACUS Symposium on Photomask Technology and Management

KEYWORDS: Metrology, Quartz, Reflectivity, Telecommunications, Photomasks, Semiconducting wafers, Environmental sensing, Performance modeling, Photomask technology, Phase shifts

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Proceedings Article | 1 June 1990 Paper

Environmental effects on registration and accuracy data on quartz photomasks utilizing the LMS-2000 laser metrology system

Larry Land, John Whittey

Proc. SPIE. 1261, Integrated Circuit Metrology, Inspection, and Process Control IV

KEYWORDS: Metrology, Inspection, Control systems, Humidity, Process control, Photomasks, Integrated circuits, Laser metrology, Temperature metrology, Laser systems engineering

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Showing 5 of 16 publications

Conference Committee Involvement (2)

Photomask Technology

15 September 2009 | Monterey, California, United States

Photomask Technology

7 October 2008 | Monterey, California, United States

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