CONFERENCE PROCEEDINGS
Advanced Search
Dr. Jon W. Heyl
President at Controlled Semiconductor Inc
SPIE Involvement:
Author
Publications (2)
Proceedings Article | 15 May 2007 Paper
Integration of optical inspection and metrology functions into DUV femtosecond laser repair tool for large-area FPD photomasks
Leon Treyger, Jon Heyl, Donald Ronning, Donald Ducharme
Proceedings Volume 6607, 66072N (2007) https://doi.org/10.1117/12.729006
KEYWORDS: Photomasks, Inspection, Metrology, Chemical vapor deposition, Computer aided design, Laser processing, Femtosecond phenomena, Laser development, Deep ultraviolet, Objectives
Proceedings Article | 20 October 2006 Paper
Advanced femtosecond DUV laser mask repair tool for large area photomasks
Leon Treyger, Jon Heyl, Michael Fink, Iztok Koren, Yonggang Li, Donald Ronning, Farrell Small, Bin Xian
Proceedings Volume 6349, 63494G (2006) https://doi.org/10.1117/12.686505
KEYWORDS: Photomasks, Chemical vapor deposition, Femtosecond phenomena, Deep ultraviolet, Laser ablation, Metals, Glasses, Objectives, Computer programming, Laser development
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top