Dr. Jon L. Opsal
CTO & Senior Vice President of Research at KLA-Tencor
SPIE Involvement:
Author
Publications (19)

Proceedings Article | 5 April 2007 Paper
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Ellipsometry, Metrology, Data modeling, Data acquisition, Artificial neural networks, Reflectometry, Process control, Spectroscopic ellipsometry, Critical dimension metrology, Standards development

Proceedings Article | 10 May 2005 Paper
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Lithography, Metrology, Optical lithography, Data modeling, Spectroscopy, Inspection, Reflectometry, Process control, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 10 May 2005 Paper
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Metrology, Data modeling, Dispersion, Spectroscopy, Germanium, Silicon, Optical metrology, Reflectometry, Spectrophotometry, Semiconducting wafers

Proceedings Article | 10 May 2005 Paper
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Lithography, Data modeling, Calibration, Scanning electron microscopy, Scatterometry, Time metrology, Optical proximity correction, Semiconducting wafers, Scatter measurement, Process modeling

Proceedings Article | 10 May 2005 Paper
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Oxides, Thin films, Ellipsometry, Dispersion, Inspection, Diagnostics, Reflectometry, Reflectance spectroscopy, Semiconducting wafers, Line scan image sensors

Showing 5 of 19 publications
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