Mr. Jonas Hellgren Profile

Jonas Hellgren

at Micronic Laser Systems AB

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Author

Publications (3)

Proceedings Article | 3 May 2007 Paper

Improved CD uniformity for advanced masks using the Sigma7500 pattern generator and ProcessEqualizer

Robert Eklund, Anders Österberg, Jonas Hellgren, Hans Fosshaug, Tord Karlin, Tom Newman

Proceedings Volume 6533, 65330C (2007) https://doi.org/10.1117/12.736923

KEYWORDS: Photomasks, Critical dimension metrology, Spatial light modulators, Convolution, Raster graphics, Neodymium, Electron beam lithography, Data modeling, Deep ultraviolet, Printing

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Proceedings Article | 20 May 2006 Paper

Reducing process contributions to CD error range using the Sigma7500 pattern generator and ProcessEqualizer

Jonas Hellgren, Hans Fosshaug, Anders Österberg, Lars Ivansen

Proceedings Volume 6283, 62831I (2006) https://doi.org/10.1117/12.681743

KEYWORDS: Critical dimension metrology, Photomasks, Convolution, Etching, Spatial light modulators, Data modeling, Raster graphics, Plasma etching, Printing, Deep ultraviolet

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Proceedings Article | 28 August 2003 Paper

Transparent corner enhancement scheme for a DUV pattern generator

Hans Martinsson, Jonas Hellgren, Niklas Eriksson, Mans Bjuggren, Tor Sandstrom

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504276

KEYWORDS: Photomasks, Spatial light modulators, Deep ultraviolet, Mirrors, Image enhancement, Manufacturing, Optical simulations, Solids, Optical proximity correction, Raster graphics

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