Dr. Jonathan L. Cobb
SPIE Involvement:
Author
Publications (36)

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11328, Design-Process-Technology Co-optimization for Manufacturability XIV
KEYWORDS: Fin field effect transistors, Standards development, Transistors, Clocks, Device simulation, TCAD, Logic, Design for manufacturability

Proceedings Article | 5 April 2011 Paper
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Optical proximity correction, Extreme ultraviolet, Photomasks, Reticles, Extreme ultraviolet lithography, 193nm lithography, Lithography, Manufacturing, Optical lithography, Model-based design

Proceedings Article | 23 March 2010 Paper
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Extreme ultraviolet, Optical proximity correction, Photomasks, Calibration, Optical lithography, Data modeling, Extreme ultraviolet lithography, Point spread functions, Reticles, 3D modeling

Proceedings Article | 17 October 2008 Paper
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Optical proximity correction, Atrial fibrillation, Lithography, Lithographic illumination, Manufacturing, Resolution enhancement technologies, Optical lithography, Process modeling, Semiconductors, Semiconducting wafers

Proceedings Article | 27 March 2007 Paper
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Optical lithography, Optical proximity correction, Error analysis, Resolution enhancement technologies, SRAF, Lithography, OLE for process control, Photomasks, Manufacturing, Metrology

Showing 5 of 36 publications
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