Mr. Jong-Doo Kim Profile

Jong-Doo Kim

at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Author

Publications (9)

Proceedings Article | 28 March 2014 Paper

"Smart" source, mask, and target co-optimization to improve design related lithographically weak spots

No-Young Chung, Pil-Soo Kang, Na-Rae Bang, Jong-Du Kim, Suk-Ju Lee, Byung-Il Choi, Bong-Ryoul Choi, Sung-Woon Park, Ki-Ho Baik, Stephen Hsu, Rafael Howell, Xiaofeng Liu, Keith Gronlund

Proceedings Volume 9053, 90530H (2014) https://doi.org/10.1117/12.2047077

KEYWORDS: Photomasks, Source mask optimization, Optical proximity correction, Metals, Manufacturing, Lithography, Photovoltaics, Resolution enhancement technologies, Optimization (mathematics), Optical lithography

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Proceedings Article | 14 October 2011 Paper

SMO applied to contact layers at the 32nm node and below with consideration of MEEF and MRC

Te-Hung Wu, Robert Sinn, Bob Gleason, JongDoo Kim, Jiyoung Hong, Sejin Park, Sukjoo Lee

Proceedings Volume 8166, 81660V (2011) https://doi.org/10.1117/12.896503

KEYWORDS: Photomasks, Source mask optimization, Fiber optic illuminators, SRAF, Logic, Optimization (mathematics), Critical dimension metrology, Semiconducting wafers, Detection and tracking algorithms, Image segmentation

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Proceedings Article | 16 March 2009 Paper

Pre-OPC layout decomposition for improved image fidelity

Shady Abdelwahed, Rami Fathy, Jae Hyun Kang, Jong Doo Kim, Youngmi Kim

Proceedings Volume 7274, 72742I (2009) https://doi.org/10.1117/12.816825

KEYWORDS: Optical proximity correction, Photomasks, Resolution enhancement technologies, Semiconducting wafers, Optical lithography, Lithography, Image processing, Manufacturing, Silicon, Microelectronics

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Proceedings Article | 16 March 2009 Paper

Smart data filtering for enhancement of model accuracy

Shady Abdelwahed, Jae Hyun Kang, Jaeyoung Choi, Jong Doo Kim, Hyesung Lee, Sungho Jun, Youngmi Kim

Proceedings Volume 7274, 727423 (2009) https://doi.org/10.1117/12.814153

KEYWORDS: Calibration, Data modeling, Process modeling, Optical proximity correction, Lithography, Semiconducting wafers, Scanning electron microscopy, Photomasks, Image processing, Critical dimension metrology

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Proceedings Article | 17 October 2008 Paper

Advanced mask technique to improve bit line CD uniformity of 90 nm node flash memory in low-k1 lithography

Jong-doo Kim, Jae-young Choi, Jea-hee Kim, Jae-won Han

Proceedings Volume 7122, 71220X (2008) https://doi.org/10.1117/12.801557

KEYWORDS: Photomasks, Lithography, Semiconducting wafers, Chromium, Optical proximity correction, Optical simulations, Resolution enhancement technologies, Binary data, Electrons, Optical lithography

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Proceedings Article | 1 April 2008 Paper

Full chip compensation for local-flare-induced CD error using OPC/DRC method

Jae-Young Choi, Yeon-Ah Shim, Kyung-Hee Yun, Jong-Doo Kim, Jae-Hee Kim, Jae-Won Han

Proceedings Volume 6924, 69243L (2008) https://doi.org/10.1117/12.773092

KEYWORDS: Optical proximity correction, Data modeling, Critical dimension metrology, Semiconducting wafers, Photomasks, Error analysis, Lithography, Scattering, Glasses, Metals

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Proceedings Article | 7 March 2008 Paper

Reticle CD error calibrated OPC model generation

Youngmi Kim, Jae-Young Choi, Jong-Doo Kim, Jeahee Kim, Jae-Won Han

Proceedings Volume 6924, 69243J (2008) https://doi.org/10.1117/12.773026

KEYWORDS: Data modeling, Reticles, Optical proximity correction, Critical dimension metrology, Calibration, Cadmium, Databases, Statistical modeling, Semiconducting wafers, Photomasks

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Proceedings Article | 7 March 2008 Paper

OPC modeling setup with considering flare effect

Jong-doo Kim, Jae-young Choi, Jea-hee Kim, Jae-won Han

Proceedings Volume 6924, 692442 (2008) https://doi.org/10.1117/12.772454

KEYWORDS: Critical dimension metrology, Optical proximity correction, Semiconducting wafers, Data modeling, Light scattering, Photomasks, Lens design, Manufacturing, Lithography, Optimization (mathematics)

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Proceedings Article | 21 March 2007 Paper

Image tone optimization in advanced mask making for DUV lithography

Jong-doo Kim, Mun-hoe Do, Seong-ho Jeong, Jea-hee Kim, Keeho Kim

Proceedings Volume 6519, 65193L (2007) https://doi.org/10.1117/12.712038

KEYWORDS: Photomasks, Optical proximity correction, Data modeling, Manufacturing, Semiconducting wafers, Deep ultraviolet, Image processing, Photoresist processing, Lithography, Process modeling

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Showing 5 of 9 publications

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