Jong-Doo Kim
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 28 March 2014 Paper
Proc. SPIE. 9053, Design-Process-Technology Co-optimization for Manufacturability VIII
KEYWORDS: Lithography, Photovoltaics, Optical lithography, Metals, Manufacturing, Photomasks, Source mask optimization, Optical proximity correction, Optimization (mathematics), Resolution enhancement technologies

Proceedings Article | 14 October 2011 Paper
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Logic, Detection and tracking algorithms, Image segmentation, Photomasks, Source mask optimization, SRAF, Critical dimension metrology, Optimization (mathematics), Semiconducting wafers, Fiber optic illuminators

Proceedings Article | 16 March 2009 Paper
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Optical lithography, Image processing, Silicon, Manufacturing, Microelectronics, Photomasks, Optical proximity correction, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 16 March 2009 Paper
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Data modeling, Calibration, Image processing, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Process modeling

Proceedings Article | 17 October 2008 Paper
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Lithography, Optical lithography, Electrons, Chromium, Photomasks, Optical simulations, Optical proximity correction, Semiconducting wafers, Binary data, Resolution enhancement technologies

Showing 5 of 9 publications
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