Jongkyun Hong
Member/Technical Staff at ASML Nederlands B.V.
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 13 March 2018 Presentation + Paper
Junghun Oh, Kwang-Seok Maeng , Jae-Hyung Shin, Won-Woong Choi, Sung-Keun Won, Cedric Grouwstra, Mohamed El Kodadi, Stephan Heil, Vidar van der Meijden, Jong Kyun Hong , Sang-Jin Kim, Oh-Sung Kwon
Proceedings Volume 10585, 105851O (2018) https://doi.org/10.1117/12.2297442
KEYWORDS: Scanners, Semiconducting wafers, Metrology, Control systems, Interfaces, Logic, Critical dimension metrology, Lithography, High volume manufacturing, Environmental monitoring

Proceedings Article | 24 March 2009 Paper
Young Ki Kim, Lua Pohling, Ng Teng Hwee, Jeong Soo Kim, Peter Benyon, Jerome Depre, Jongkyun Hong, Alexander Serebriakov
Proceedings Volume 7272, 72723A (2009) https://doi.org/10.1117/12.813609
KEYWORDS: Scanners, Critical dimension metrology, Imaging systems, Calibration, Reticles, Lithography, Data modeling, Finite element methods, Manufacturing, Optics manufacturing

Proceedings Article | 16 March 2009 Paper
Proceedings Volume 7274, 72743I (2009) https://doi.org/10.1117/12.816521
KEYWORDS: Semiconducting wafers, Scanners, Metals, Photomasks, Lithography, Lithographic illumination, Printing, Optical proximity correction, High volume manufacturing, Overlay metrology

Proceedings Article | 5 April 2007 Paper
Proceedings Volume 6518, 651821 (2007) https://doi.org/10.1117/12.712051
KEYWORDS: Semiconducting wafers, Optical proximity correction, Computer aided design, Overlay metrology, Process control, Inspection, Design for manufacturing, Resolution enhancement technologies, Metrology, Critical dimension metrology

Proceedings Article | 27 March 2007 Paper
Chanha Park, Jongkyun Hong, Kiho Yang, Thomas Theeuwes, Frederic Gautier, Young-Hong Min, Alek Chen, Hyunjo Yang, Donggyu Yim, Jinwoong Kim
Proceedings Volume 6520, 65204X (2007) https://doi.org/10.1117/12.712366
KEYWORDS: Polarization, Critical dimension metrology, Printing, Metrology, Line edge roughness, Reticles, Picosecond phenomena, Resolution enhancement technologies, Optical lithography, Semiconductors

Showing 5 of 13 publications
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