Prof. Jong Rak Park Profile

Prof. Jong Rak Park

Professor at Chosun Univ

SPIE Involvement:

Author

Publications (7)

SPIE Journal Paper | 23 February 2012

Characterization of photoresist and simulation of a developed resist profile for the fabrication of gray-scale diffractive optic elements

Jong Rak Park, Justin Sierchio, Melissa Zaverton, Youngsik Kim, Thomas Milster

OE, Vol. 51, Issue 02, 023401, (February 2012) https://doi.org/10.1117/12.10.1117/1.OE.51.2.023401

KEYWORDS: Photoresist materials, Photoresist developing, Optical components, Absorption, Bragg cells, Device simulation, Photoresist processing, Image processing, Lithography, Optical engineering

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Proceedings Article | 26 June 2003 Paper

Improvement of shot uniformity on a wafer by controlling backside transmittance distribution of a photomask

Jong Rak Park, Soon Ho Kim, Gi-Sung Yeo, Sung-Woon Choi, Won-Tai Ki, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485391

KEYWORDS: Critical dimension metrology, Photomasks, Semiconducting wafers, Scanners, Transmittance, Optical lithography, Coating, Etching, Photoresist processing, Optical filters

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Proceedings Article | 26 June 2003 Paper

Flare-induced CD variation correction using transmittance controlled mask

Dong-Seok Nam, Gi-Sung Yeo, Jong Rak Park, Sung-Woon Choi, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485409

KEYWORDS: Critical dimension metrology, Photomasks, Semiconducting wafers, Transmittance, Contamination, Cadmium, Control systems, Quartz, Optical lithography, Semiconductors

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Proceedings Article | 27 December 2002 Paper

Analytical approach to X-phenomenon in alternating phase-shifting masks

Jong Rak Park, Soon Ho Kim, Hojune Lee, Il-Yong Jang, Yo-Han Choi, Seung-Hune Yang, Jeong-Yoon Lee, Yong-Hoon Kim, Sung-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468092

KEYWORDS: Photomasks, Phase shifts, Error analysis, Semiconducting wafers, Fourier transforms, Reticles, Wafer-level optics, Convolution, Image acquisition, Holmium

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Proceedings Article | 27 December 2002 Paper

Simple method for separating and evaluating origins of a side error in mask CD uniformity: photomask blanks and mask-making processes

Yo-Han Choi, Jong-Rak Park, Moon-Gyu Sung, Seung-Hune Yang, Soon-Ho Kim, Ho-June Lee, Jeong-Yun Lee, Il-Yong Jang, Yong-Hoon Kim, Sung-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468099

KEYWORDS: Photomasks, Critical dimension metrology, Error analysis, Photoresist processing, Data modeling, Quantitative analysis, Chemically amplified resists, Integrated circuits, Semiconducting wafers, Etching

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Proceedings Article | 27 December 2002 Paper

Fogging effect consideration in mask process at 50-KeV e-beam systems

Seung-Hune Yang, Yo-Han Choi, Jong-Rak Park, Yong-Hoon Kim, Sung-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468100

KEYWORDS: Gaussian beams, Modulation, Vestigial sideband modulation, Critical dimension metrology, Beam shaping, Raster graphics, Electron beams, Photomasks, Mask making, Electrons

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Proceedings Article | 16 July 2002 Paper

Proximity effect correction optimization considering fogging and loading effects compensation

Seung-Hune Yang, Yo-Han Choi, Jong Park, Yong-Hoon Kim, Seong-Woon Choi, Jung-Min Sohn

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473426

KEYWORDS: Critical dimension metrology, Etching, Beam shaping, Mask making, Backscatter, Scattering, Cadmium, Electron beam lithography, Modulation, Photomasks

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Showing 5 of 7 publications

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