Jongwook Kye
VP at Samsung Electronics Co., Ltd.
SPIE Involvement:
Nominating Committee | Editor | Author | Instructor
Publications (47)

Proceedings Article | 26 April 2017 Presentation
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Optical proximity correction, Silicon photonics, High volume manufacturing, Sun, Optical lithography, Current controlled current source

Proceedings Article | 30 March 2017 Presentation + Paper
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Optical lithography, Optical proximity correction, Directed self assembly, Resolution enhancement technologies, Etching, Monte Carlo methods, Photomasks, Manufacturing, Metals, Logic, Visualization, Error analysis, Solids

Proceedings Article | 28 March 2017 Paper
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Design for manufacturing, Power supplies, Integrated circuit design, Electronic design automation, Transistors, Logic, Switching, Inductance, Reliability, Resistance, Capacitance, Metals

Proceedings Article | 28 March 2017 Paper
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Process control, Metrology, Optical metrology, Defect inspection, Inspection, Semiconducting wafers, Critical dimension metrology, Finite element methods, Wafer-level optics, Line edge roughness, Lithography, Optics manufacturing

Proceedings Article | 27 March 2017 Paper
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Data modeling, Photomasks, Reflectivity, Extreme ultraviolet, Optical proximity correction, Monte Carlo methods, Extreme ultraviolet lithography, Reflectors, Statistical analysis, Electromagnetic theory, Surface roughness, Silicon, Molybdenum, Scanning tunneling microscopy

Showing 5 of 47 publications
Proceedings Volume Editor (1)

SPIE Conference Volume | 25 August 2016

Conference Committee Involvement (7)
Optical Microlithography XXIX
23 February 2016 | San Jose, California, United States
Optical Microlithography XXVIII
24 February 2015 | San Jose, California, United States
Optical Microlithography XXVII
25 February 2014 | San Jose, California, United States
Optical Microlithography XXVI
26 February 2013 | San Jose, California, United States
Optical Microlithography XXV
14 February 2012 | San Jose, California, United States
Showing 5 of 7 Conference Committees
Course Instructor
SC779: Polarization for Lithographers
The advent of ultra high numerical aperture (NA) systems enabled by immersion lithography has quickly brought polarization toward the top of the lithographer's list of concerns. A high index liquid between the resist and the last lens element allows better resolution by enabling larger angles of incidence, and thus more diffraction energy to couple into the resist. However various polarizing effects can become severe with these large angles of incidence. Most notably contrast from the TM component drops to near or below zero. Thus, the engineering of polarization states is becoming a necessary resolution enhancement technique. Consequently, understanding and controlling polarization throughout all components of the optical system become critical. This course provides the lithographer a basic knowledge of polarization and its application to high-NA imaging. After an introduction to the concept of polarization and the various ways it can be represented, both the benefits and limitations of its application to lithography are discussed. The polarizing effects of each component of the optical system are addressed, offering an understanding of their ultimate impact on imaging.
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