Dr. Joost Bekaert
at imec
SPIE Involvement:
Author
Publications (64)

Proceedings Article | 30 October 2020 Presentation + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Reticles, Imaging systems, Image resolution, Photomasks, Extreme ultraviolet, Optical proximity correction, Semiconducting wafers

Proceedings Article | 21 September 2020 Presentation
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Semiconductors, Metrology, Optical lithography, Etching, Scanners, Ecosystems, Image quality, Photomasks, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 24 March 2020 Presentation
Proc. SPIE. 11329, Advanced Etch Technology for Nanopatterning IX

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Lithography, Optical lithography, Cadmium, Calibration, Etching, Silicon, 3D modeling, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 29 November 2019 Presentation + Paper
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Metrology, Cadmium, Defect detection, Etching, Inspection, Finite element methods, Critical dimension metrology, Optical correlators, Failure analysis, Stochastic processes

Showing 5 of 64 publications
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