Dr. Jordi Teva
Process R&D Engineer at austriamicrosystems AG
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 29 May 2013 Paper
Anton Köck, Elise Brunet, Oliver Freudenberg, Christoph Gamauf, Jochen Kraft, Giorgio Mutinati, Thomas Maier, Alexander Nemecek, Franz Schrank, Martin Schrems, Martin Siegele, Jörg Siegert, Stephan Steinhauer, Jordi Teva
Proceedings Volume 8725, 87250L (2013) https://doi.org/10.1117/12.2016526
KEYWORDS: Gas sensors, Sensors, Carbon monoxide, Resistance, Environmental monitoring, Gases, Metals, Target detection, CMOS technology, Nanowires

Proceedings Article | 22 May 2013 Paper
A. Kraxner, E. Wachmann, I. Jonak-Auer, J. Teva, J. M. Park, R. Minixhofer
Proceedings Volume 8767, 87670P (2013) https://doi.org/10.1117/12.2017540
KEYWORDS: Doping, Diffusion, Photodiodes, Quantum efficiency, Diodes, Standards development, Optical filters, Silicon, Surface plasmons, CMOS technology

Proceedings Article | 12 May 2012 Paper
I. Jonak-Auer, J. Teva, J. M. Park, S. Jessenig, M. Rohrbacher, E. Wachmann
Proceedings Volume 8431, 843115 (2012) https://doi.org/10.1117/12.922268
KEYWORDS: Photodiodes, Doping, PIN photodiodes, Capacitance, Silicon, Semiconducting wafers, Deposition processes, Surface plasmons, Sensors, Logic

Proceedings Article | 9 May 2011 Paper
Jordi Teva, Stefan Jessenig, Ingrid Jonak-Auer, Franz Schrank, Ewald Wachmann
Proceedings Volume 8073, 80731P (2011) https://doi.org/10.1117/12.886985
KEYWORDS: Diffusion, Photodiodes, PIN photodiodes, Silicon, Doping, Data modeling, Modeling, Temperature metrology, Diodes, Transistors

Proceedings Article | 16 February 2010 Paper
Jordi Teva, Ingrid Jonak-Auer, Franz Schrank, Jochen Kraft, Joerg Siegert, Ewald Wachmann
Proceedings Volume 7605, 76050A (2010) https://doi.org/10.1117/12.842231
KEYWORDS: Photodiodes, Diffusion, PIN photodiodes, Transistors, Silicon, Temperature metrology, Doping, Semiconductors, Semiconducting wafers, Data modeling

Showing 5 of 8 publications
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