Dr. Jörn N. Greif
at Carl Zeiss Jena GmbH
SPIE Involvement:
Publications (5)

Proceedings Article | 15 October 2005 Paper
Proc. SPIE. 5962, Optical Design and Engineering II
KEYWORDS: Optical components, Diffraction, Light sources, Diffractive optical elements, Modulation, Speckle, Microscopy, Fourier transforms, Diffusers, Optical simulations

Proceedings Article | 27 January 2005 Paper
Proc. SPIE. 5645, Advanced Microlithography Technologies
KEYWORDS: Lithography, Reticles, Polarization, Scanners, Manufacturing, Photomasks, Neodymium, Semiconducting wafers, Tolerancing, Liquids

Proceedings Article | 2 June 2004 Paper
Proc. SPIE. 5504, 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Lithography, Reticles, Lithographic illumination, Polarization, Image resolution, Objectives, Photomasks, Semiconducting wafers, 193nm lithography, Beam homogenizers

Proceedings Article | 24 May 2004 Paper
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Lithography, Reticles, Homogenization, Lithographic illumination, Polarization, Scanners, Photomasks, Semiconducting wafers, Beam homogenizers, Phase shifts

Proceedings Article | 6 June 1997 Paper
Proc. SPIE. 2994, Physics and Simulation of Optoelectronic Devices V
KEYWORDS: Fiber amplifiers, Switching, Waveguides, High power lasers, Laser applications, Semiconductor lasers, Near field, Picosecond phenomena, Optical pumping, Waveguide lasers

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