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Joseph Tzeng
at Toppan Chunghwa Electronics Co Ltd
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Publications (2)
Proceedings Article | 15 May 2007 Paper
The effect between absorber profile and wafer print process window in ArF 6% Att. PSM mask
Joseph Tzeng, Booky Lee, Jerry Lu, Makoto Kozuma, Noah Chen, Wen Kuang Lin, Army Chung, Yow Choung Houng, Chi Hung Wei
Proceedings Volume 6607, 660736 (2007) https://doi.org/10.1117/12.729025
KEYWORDS: Photomasks, Semiconducting wafers, Lithography, 193nm lithography, Critical dimension metrology, Scanners, Wafer-level optics, Manufacturing, Lutetium, Microelectronics
Proceedings Article | 20 October 2006 Paper
The effect between mask blank flatness and wafer print process window in ArF 6% att. PSM mask
Joseph Tzeng, Booky Lee, Jerry Lu, Makoto Kozuma, Noah Chen, Wen Kuang Lin, Army Chung, Yow Choung Houng, Chi Hung Wei
Proceedings Volume 6349, 634954 (2006) https://doi.org/10.1117/12.692881
KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Chromium, Printing, 193nm lithography, Quartz, Polishing, Lutetium, Microelectronics
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