Dr. Juan Andres Torres
Advanced RET Flow Architect at Mentor, a Siemens Business
SPIE Involvement:
Author | Instructor
Publications (60)

SPIE Journal Paper | 23 March 2018
JM3 Vol. 17 Issue 01
KEYWORDS: Directed self assembly, Connectors, Global Positioning System, Curium, Model-based design, Detection and tracking algorithms, Calibration, Monte Carlo methods, Data modeling, Failure analysis

Proceedings Article | 30 March 2017 Presentation + Paper
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Optical lithography, Optical proximity correction, Directed self assembly, Resolution enhancement technologies, Etching, Monte Carlo methods, Photomasks, Manufacturing, Metals, Logic, Visualization, Error analysis, Solids

Proceedings Article | 21 March 2017 Presentation + Paper
Proc. SPIE. 10144, Emerging Patterning Technologies
KEYWORDS: Directed self assembly, Optical lithography, Monte Carlo methods, Photomasks, Manufacturing, Lithography, Double patterning technology, Printing, Optics manufacturing, Chemical analysis, Global Positioning System, Resolution enhancement technologies, Composites

Proceedings Article | 21 March 2017 Presentation + Paper
Proc. SPIE. 10144, Emerging Patterning Technologies
KEYWORDS: Electronic design automation, Photomasks, Polymers, Optical lithography, Design for manufacturing, Lithography, Epitaxy, Inspection, Directed self assembly, Manufacturing, Systems modeling, Visualization, Data modeling

Proceedings Article | 21 March 2017 Paper
Proc. SPIE. 10144, Emerging Patterning Technologies
KEYWORDS: Calibration, Printing, Resolution enhancement technologies, Monte Carlo methods, Lithography, Model-based design, Optimization (mathematics), Detection and tracking algorithms, Directed self assembly, Connectors, Photomasks, Optical lithography

Showing 5 of 60 publications
Conference Committee Involvement (2)
3 November 2014 |
Design Automation Conference
1 June 2014 |
Course Instructor
SC1101: Understanding Design-Patterning Interactions
This course explains how layout and circuit design interact with lithography choices. We especially focus on multi-patterning technologies such as LELE double patterning and SADP. We will explore role of design in lithography technology development as well as in lithographic process control. We will further discuss design enablement of multi-patterning technologies, especially in context of cell-based digital designs.
SC1187: Understanding Design-Patterning Interactions for EUV and DSA
EUV lithography and DSA haven been accepted by the industry as most promising candidates for dimensional scaling enablement at N7 technology node and beyond. This tutorial explains how introduction of such lithography technologies going to impact layout and circuit design. Choices of lithography would impact physical design and have a significant impact at system level. This tutorial will focus on transition from 193i multi-patterning technologies to EUV lithography and DSA. Factors that would determine on the enablement of these technologies would be highlighted and possible solutions would be shared.
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