Judon Stoeldraijer
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (23)

Proceedings Article | 22 February 2021 Presentation
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII
KEYWORDS: Mirrors, Optical lithography, Sensors, Scanners, Lens design, Printing, Projection systems, Extreme ultraviolet lithography, High volume manufacturing, Device simulation

Proceedings Article | 7 January 2021 Presentation + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Optical lithography, Sensors, Scanners, Lens design, Buildings, Printing, Projection systems, Extreme ultraviolet lithography, High volume manufacturing, Device simulation

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Lithography, Mirrors, Metrology, Lithographic illumination, Projection systems, Light sources and illumination, Extreme ultraviolet, Extreme ultraviolet lithography, Optics manufacturing, EUV optics

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Scanners, Particles, Photoresist materials, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Optics manufacturing, Stochastic processes

Proceedings Article | 16 October 2019 Presentation
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Thermography, Sensors, Scanners, Lens design, Pellicles, Photomasks, Extreme ultraviolet lithography, High volume manufacturing

Showing 5 of 23 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top