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Julio R. Reyes
Senior Engineer at Toppan Photomasks Inc
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Author
Publications (4)
Proceedings Article | 17 December 2003 Paper
EUV mask making: an approach based on the direct patterning of the EUV reflector
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518259
KEYWORDS: Photomasks, Extreme ultraviolet, Optical lithography, Etching, Extreme ultraviolet lithography, Reflectivity, Inspection, Reflectors, Lithography, Image processing
Proceedings Article | 17 December 2003 Paper
193-nm haze contamination: a close relationship between mask and its environment
Eric Johnstone, Laurent Dieu, Christian Chovino, Julio Reyes, Dongsung Hong, Prakash Krishnan, Dianna Coburn, Christian Capella
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518262
KEYWORDS: Photomasks, Air contamination, Contamination, Pellicles, Reticles, Binary data, Glasses, Chemistry, Inspection, Environmental sensing
Proceedings Article | 17 December 2003 Paper
Immersion system process optimization for 248-nm and 193-nm photomasks: binary and EAPSM
Gim Chen, Julio Reyes, James Wood, Ismail Kashkoush, Laurent Dieu, Richard Novak
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518247
KEYWORDS: Photomasks, Transmittance, Reticles, Chemistry, Photoresist processing, Binary data, Mask cleaning, Reflectivity, Photoresist materials, Particles
Proceedings Article | 28 August 2003 Paper
Semi-aqueous solvent applications for 193-nm EAPSM resist strip
Julio Reyes, Curt Jackson, Laurent Dieu, William Bowers, Russell Stevens
Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504265
KEYWORDS: Reflectivity, Photomasks, Scanning probe microscopy, Chlorine, Photoresist processing, Etching, Phase shifts, Fluorine, Contamination, Phase measurement
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