Dr. Julius Joseph S. Santillan
Researcher at Osaka Univ
SPIE Involvement:
Author
Publications (37)

Proceedings Article | 16 March 2021 Presentation + Paper
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII
KEYWORDS: Semiconductors, Lithography, Optical lithography, Scanning electron microscopy, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Line edge roughness, Medium wave, Photoresist processing

Proceedings Article | 14 October 2020 Poster + Presentation + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Lithography, Optical lithography, Bridges, Line width roughness, Extreme ultraviolet lithography, Photoresist processing, Stochastic processes, Standards development

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Semiconductors, Lithography, Optical lithography, Extreme ultraviolet lithography, Photoresist processing

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11327, Optical Microlithography XXXIII
KEYWORDS: Packaging, Semiconductors, Optical lithography, Laser applications, Laser ablation, Excimer lasers, Laser systems engineering

Proceedings Article | 28 June 2019 Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Oxides, Nanoparticles, Metals, X-rays, Reflectivity, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Zirconium dioxide

Showing 5 of 37 publications
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