Dr. Jun-Fei Zheng Profile

Dr. Jun-Fei Zheng

Staff Research at Intel Corp

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Author

Publications (7)

Proceedings Article | 14 June 2004 Paper

Novel planarization and passivation in the integration of III-V semiconductor devices

Jun-Fei Zheng, Peter Hanberg, Hilmi Demir, Vijit Sabnis, Onur Fidaner, James Harris, David Miller

Proceedings Volume 5356, (2004) https://doi.org/10.1117/12.529696

KEYWORDS: Polymers, Photomasks, Etching, Metals, Semiconducting wafers, Silicon, Diodes, Oxides, Group III-V semiconductors, Wet etching

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Proceedings Article | 14 September 2001 Paper

Mechanical analysis of hard pellicles for 157-nm lithography

Phillip Reu, Andrew Mikkelson, Michael Schlax, Eric Cotte, Lowell Siewert, Roxann Engelstad, Edward Lovell, Giang Dao, Jun-Fei Zheng

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435651

KEYWORDS: Pellicles, Reticles, Lithography, Aluminum, Velocity measurements, Finite element methods, Silica, Optical components, Adhesives, Modal analysis

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Proceedings Article | 22 January 2001 Paper

Localized resist heating due to electron-beam patterning during photomask fabrication

Alexander Wei, William Beckman, Roxann Engelstad, John Mitchell, Thanh Phung, Jun-Fei Zheng

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410727

KEYWORDS: Electron beam lithography, Picosecond phenomena, Photomasks, Optical lithography, Diffusion, Critical dimension metrology, Spatial resolution, Temperature metrology, Electron beams, Thermal effects

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Proceedings Article | 22 January 2001 Paper

Pellicle-induced distortions in advanced optical reticles

William Semke, Lowell Siewert, Andrew Mikkelson, Eric Risius, Ning Tang, Roxann Engelstad, Edward Lovell, Jun-Fei Zheng, Giang Dao

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410695

KEYWORDS: Pellicles, Reticles, Photomasks, Adhesives, Analytical research, Lithography, Sensors, Aluminum, Error analysis, Finite element methods

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Proceedings Article | 22 January 2001 Paper

Impact of surface contamination on transmittance of modified fused silica for 157-nm lithography application

Jun-Fei Zheng, Ronald Kuse, Arun Ramamoorthy, Giang Dao, Fu-Chang Lo

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410758

KEYWORDS: Transmittance, Contamination, Chromium, Etching, Photomasks, Silica, Xenon, Lamps, Excimers, Dry etching

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Proceedings Article | 19 July 2000 Paper

Current status of 157-nm mask technology development

Giang Dao, Ronald Kuse, Kevin Orvek, Eric Panning, Roswitha Remling, Jun-Fei Zheng, Munehiko Tsubosaki, Fu-Chang Lo

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392091

KEYWORDS: Photomasks, Reticles, Pellicles, Silica, Lithography, Contamination, Chromium, Manufacturing, Semiconducting wafers, Transmittance

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Proceedings Article | 5 July 2000 Paper

Progress in 157-nm lithography development at Intel: resists and reticles

Veena Rao, Eric Panning, Ling Liao, John Hutchinson, Andrew Grenville, Susan Holl, Don Bruner, Raghu Balasubramanian, Ronald Kuse, Giang Dao, Jun-Fei Zheng, Kevin Orvek, Joseph Langston, Fu-Chang Lo

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389005

KEYWORDS: Photomasks, Lithography, Photoresist developing, Reticles, Silica, Optical lithography, Photoresist materials, Chromium, Phase shifts, Absorbance

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Showing 5 of 7 publications

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