Dr. Jun-Fei Zheng Profile

Dr. Jun-Fei Zheng

Staff Research at Intel Corp

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Author

Publications (7)

Proceedings Article | 14 June 2004 Paper

Novel planarization and passivation in the integration of III-V semiconductor devices

Jun-Fei Zheng, Peter Hanberg, Hilmi Demir, Vijit Sabnis, Onur Fidaner, James Harris, David Miller

Proc. SPIE. 5356, Optoelectronic Integrated Circuits VI

KEYWORDS: Oxides, Etching, Polymers, Metals, Silicon, Diodes, Photomasks, Wet etching, Semiconducting wafers, Group III-V semiconductors

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Proceedings Article | 14 September 2001 Paper

Mechanical analysis of hard pellicles for 157-nm lithography

Phillip Reu, Andrew Mikkelson, Michael Schlax, Eric Cotte, Lowell Siewert, Roxann Engelstad, Edward Lovell, Giang Dao, Jun-Fei Zheng

Proc. SPIE. 4346, Optical Microlithography XIV

KEYWORDS: Optical components, Lithography, Reticles, Silica, Pellicles, Modal analysis, Finite element methods, Aluminum, Velocity measurements, Adhesives

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Proceedings Article | 22 January 2001 Paper

Impact of surface contamination on transmittance of modified fused silica for 157-nm lithography application

Jun-Fei Zheng, Ronald Kuse, Arun Ramamoorthy, Giang Dao, Fu-Chang Lo

Proc. SPIE. 4186, 20th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Contamination, Silica, Etching, Dry etching, Lamps, Chromium, Xenon, Transmittance, Photomasks, Excimers

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Proceedings Article | 22 January 2001 Paper

Pellicle-induced distortions in advanced optical reticles

William Semke, Lowell Siewert, Andrew Mikkelson, Eric Risius, Ning Tang, Roxann Engelstad, Edward Lovell, Jun-Fei Zheng, Giang Dao

Proc. SPIE. 4186, 20th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Lithography, Reticles, Sensors, Error analysis, Pellicles, Finite element methods, Photomasks, Aluminum, Analytical research, Adhesives

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Proceedings Article | 22 January 2001 Paper

Localized resist heating due to electron-beam patterning during photomask fabrication

Alexander Wei, William Beckman, Roxann Engelstad, John Mitchell, Thanh Phung, Jun-Fei Zheng

Proc. SPIE. 4186, 20th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Electron beam lithography, Electron beams, Optical lithography, Diffusion, Thermal effects, Photomasks, Picosecond phenomena, Spatial resolution, Critical dimension metrology, Temperature metrology

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Proceedings Article | 19 July 2000 Paper

Current status of 157-nm mask technology development

Giang Dao, Ronald Kuse, Kevin Orvek, Eric Panning, Roswitha Remling, Jun-Fei Zheng, Munehiko Tsubosaki, Fu-Chang Lo

Proc. SPIE. 4066, Photomask and Next-Generation Lithography Mask Technology VII

KEYWORDS: Lithography, Reticles, Contamination, Silica, Manufacturing, Chromium, Pellicles, Transmittance, Photomasks, Semiconducting wafers

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Proceedings Article | 5 July 2000 Paper

Progress in 157-nm lithography development at Intel: resists and reticles

Veena Rao, Eric Panning, Ling Liao, John Hutchinson, Andrew Grenville, Susan Holl, Don Bruner, Raghu Balasubramanian, Ronald Kuse, Giang Dao, Jun-Fei Zheng, Kevin Orvek, Joseph Langston, Fu-Chang Lo

Proc. SPIE. 4000, Optical Microlithography XIII

KEYWORDS: Lithography, Reticles, Optical lithography, Silica, Chromium, Photoresist materials, Photomasks, Absorbance, Photoresist developing, Phase shifts

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Showing 5 of 7 publications

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