Mr. Jun Sik Lee Profile

Jun Sik Lee

at Hynix Semiconductor Inc

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Author

Publications (7)

Proceedings Article | 19 May 2008 Paper

An explosive haze formation under low energy exposure

Junsik Lee, Yongdae Kim, Yongkyoo Choi, Changreol Kim

Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV

KEYWORDS: Packaging, Reticles, Air contamination, Ultraviolet radiation, Inspection, Raman spectroscopy, Organic materials, Pellicles, Photomasks, Explosives

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Proceedings Article | 19 May 2008 Paper

The source of carbon contamination for EUV mask production

Yongdae Kim, Junsik Lee, Yongkyoo Choi, Changreol Kim

Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV

KEYWORDS: Carbon, Lithography, Contamination, Reflectivity, Raman spectroscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Scanning probe microscopy, Analytical research

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Proceedings Article | 9 November 2005 Paper

Survey of SO₄ outgas on mask storage environment

Jun Sik Lee, Sung Bae Jee, Sung Min Hwang, Hyun Yul Park, Oscar Han

Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Reticles, Contamination, Air contamination, Molecules, Ions, Manufacturing, Pellicles, Photomasks, Semiconducting wafers, Environmental sensing

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Proceedings Article | 5 November 2005 Paper

The surface treatment for prevention of growing defect

Jea-Young Jun, Ji-Sun Ryu, Yongk-Yoo Choi, Oscar Han

Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Etching, Dry etching, Air contamination, Glasses, Ions, Heat treatments, Atomic force microscopy, Photomasks, Wet etching, Molybdenum

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Proceedings Article | 6 December 2004 Paper

Effect of UV/O3 treatment on mask surface to reducing sulfuric residue ions

Dong Wook Lee, Ho Yong Jung, Mun Sik Kim, Jun Sik Lee, Yong Kyoo Choi, Oscar Han

Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Contamination, Air contamination, Ultraviolet radiation, Ions, Atomic force microscopy, Oxygen, Transmission electron microscopy, Photomasks, Chemical analysis, Phase shifts

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Proceedings Article | 20 August 2004 Paper

Investigation of sub-pellicle defect formation at KrF lithography

Junsik Lee, Dong Wook Lee, Mun-Sik Kim, Ho-Yong Jung, Oscar Han

Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI

KEYWORDS: Reticles, Ions, Inspection, Scanning electron microscopy, Raman spectroscopy, Pellicles, Photomasks, Chemical analysis, Adhesives, Chromatography

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Proceedings Article | 20 August 2004 Paper

Investigation of Cr defect in high Cr load logic mask

Ho-Yong Jung, Sung Jin Choi, Mun-Sik Kim, Dong Wook Lee, Junsik Lee, Oscar Han

Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI

KEYWORDS: Logic, Etching, Dry etching, Image processing, Inspection, Chromium, Atomic force microscopy, Scanning electron microscopy, Photomasks, Photoresist processing

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Showing 5 of 7 publications

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