Prof. Jun Peng Profile

Prof. Jun Peng

at Simon Fraser Univ

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 1 March 2006 Paper

Laser-induced oxidation of Zn and Zn alloy films for direct-write grayscale photomasks

Yuqiang Tu, Chinheng Choo, Marian Chang, Jun Wang, Glenn Chapman, David Poon, Jun Peng

Proceedings Volume 6106, 61060F (2006) https://doi.org/10.1117/12.648618

KEYWORDS: Zinc, Photomasks, Argon ion lasers, Glasses, Zinc oxide, Objectives, Raster graphics, Modulation, Oxides, Oxidation

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Proceedings Article | 4 May 2005 Paper

Enhanced inorganic bimetallic thermal resists transparency and resolution for photomask fabrication

Willy Lennard, Glenn Chapman, James Dykes, Jun Peng, Jun Wang, Karen Kavanagh, David Poon, Chinheng Choo, Yuqiang Tu

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600463

KEYWORDS: Photomasks, Glasses, Photoresist materials, Silicon, Aluminum, Absorbance, Transparency, Silicon films, Lithography, Oxidation

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Proceedings Article | 12 April 2005 Paper

Creating precise 3D microstructures using laser direct-write bimetallic thermal resist grayscale photomasks

James Dykes, David Poon, Glenn Chapman, Jun Peng, Yuqiang Tu, Chinheng Choo, Jun Wang

Proceedings Volume 5713, (2005) https://doi.org/10.1117/12.601545

KEYWORDS: Photoresist materials, Photomasks, Glasses, Silicon, Photoresist developing, Lithography, Calibration, Raster graphics, Silicon films, Camera shutters

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Proceedings Article | 9 December 2004 Paper

Laser direct write patterned indium tin oxide films for photomasks and anisotropic resist applications

Jun Peng, Glenn Chapman, Yuqiang Tu

Proceedings Volume 5578, (2004) https://doi.org/10.1117/12.567642

KEYWORDS: Tin, Indium, Photomasks, Oxides, Etching, Silicon, Anisotropic etching, Laser processing, Semiconducting wafers, Oxidation

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Proceedings Article | 6 December 2004 Paper

Calibrating grayscale direct write bimetallic photomasks to create 3D photoresist structures

Jun Peng, David Poon, Glenn Chapman, Yuqiang Tu, Chinheng Choo, James Dykes

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569405

KEYWORDS: Photomasks, Photoresist materials, Calibration, Raster graphics, Camera shutters, Absorbance, Tin, Silicon, Transparency, Binary data

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Proceedings Article | 15 July 2004 Paper

Creating 3D structures with a direct-write grayscale photomask made from Sn/In bimetallic films

Yuqiang Tu, Glenn Chapman, Jun Peng

Proceedings Volume 5339, (2004) https://doi.org/10.1117/12.529492

KEYWORDS: Photomasks, Indium, Absorption, Argon ion lasers, Tin, Glasses, Absorbance, Photoresist materials, Binary data, Raster graphics

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Proceedings Article | 14 May 2004 Paper

Inorganic Bi/In thermal resist as a high-etch-ratio patterning layer for CF4/CHF3/O2 plasma etch

Jun Peng, Glenn Chapman, Yuqiang Tu

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536193

KEYWORDS: Etching, Plasma etching, Silicon, Plasma, Anisotropic etching, Bismuth, Indium, Wet etching, Optical lithography, Photoresist materials

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Proceedings Article | 30 December 2003 Paper

Bi/In thermal resist for both Si anisotropic wet etching and Si/SiO2 plasma etching

Jun Peng, Yuqiang Tu, Glenn Chapman

Proceedings Volume 5342, (2003) https://doi.org/10.1117/12.524690

KEYWORDS: Etching, Plasma etching, Silicon, Bismuth, Anisotropic etching, Plasma, Wet etching, Indium, Photoresist materials, Semiconducting wafers

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Proceedings Article | 17 December 2003 Paper

Creating direct-write gray-scale photomasks with bimetallic thin film thermal resists

Masahiko Mio, Yuqiang Tu, Jun Peng, James Dykes, Glenn Chapman

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518213

KEYWORDS: Photomasks, Bismuth, Absorption, Photoresist materials, Glasses, Argon ion lasers, Raster graphics, Semiconductor lasers, Binary data, Absorbance

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Proceedings Article | 12 June 2003 Paper

Wavelength invariant Bi/In thermal resist as a Si anisotropic etch masking layer and direct-write photomask material

Glenn Chapman, Yuqiang Tu, Jun Peng

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485177

KEYWORDS: Photomasks, Silicon, Etching, Anisotropic etching, Bismuth, Absorption, Glasses, Argon ion lasers, Thermal modeling, Quartz

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Showing 5 of 10 publications

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