Prof. Jun Peng Profile

Prof. Jun Peng

at Simon Fraser Univ

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 1 March 2006 Paper

Laser-induced oxidation of Zn and Zn alloy films for direct-write grayscale photomasks

Jun Wang, Marian Chang, Yuqiang Tu, David Poon, Glenn Chapman, Chinheng Choo, Jun Peng

Proc. SPIE. 6106, Photon Processing in Microelectronics and Photonics V

KEYWORDS: Oxides, Modulation, Glasses, Argon ion lasers, Zinc, Objectives, Photomasks, Raster graphics, Zinc oxide, Oxidation

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Proceedings Article | 4 May 2005 Paper

Enhanced inorganic bimetallic thermal resists transparency and resolution for photomask fabrication

Glenn Chapman, David Poon, Chinheng Choo, Yuqiang Tu, James Dykes, Jun Wang, Jun Peng, Willy Lennard, Karen Kavanagh

Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII

KEYWORDS: Lithography, Transparency, Glasses, Silicon, Photoresist materials, Silicon films, Photomasks, Aluminum, Absorbance, Oxidation

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Proceedings Article | 12 April 2005 Paper

Creating precise 3D microstructures using laser direct-write bimetallic thermal resist grayscale photomasks

Glenn Chapman, James Dykes, David Poon, Chinheng Choo, Jun Wang, Jun Peng, Yuqiang Tu

Proc. SPIE. 5713, Photon Processing in Microelectronics and Photonics IV

KEYWORDS: Lithography, Calibration, Glasses, Silicon, Photoresist materials, Silicon films, Photomasks, Raster graphics, Camera shutters, Photoresist developing

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Proceedings Article | 9 December 2004 Paper

Laser direct write patterned indium tin oxide films for photomasks and anisotropic resist applications

Jun Peng, Glenn Chapman, Yuqiang Tu

Proc. SPIE. 5578, Photonics North 2004: Photonic Applications in Astronomy, Biomedicine, Imaging, Materials Processing, and Education

KEYWORDS: Oxides, Etching, Indium, Silicon, Laser processing, Photomasks, Semiconducting wafers, Anisotropic etching, Tin, Oxidation

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Proceedings Article | 6 December 2004 Paper

Calibrating grayscale direct write bimetallic photomasks to create 3D photoresist structures

Yuqiang Tu, Glenn Chapman, James Dykes, David Poon, Chinheng Choo, Jun Peng

Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Transparency, Calibration, Silicon, Photoresist materials, Photomasks, Absorbance, Raster graphics, Binary data, Camera shutters, Tin

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Proceedings Article | 15 July 2004 Paper

Creating 3D structures with a direct-write grayscale photomask made from Sn/In bimetallic films

Glenn Chapman, Yuqiang Tu, Jun Peng

Proc. SPIE. 5339, Photon Processing in Microelectronics and Photonics III

KEYWORDS: Glasses, Indium, Argon ion lasers, Photoresist materials, Photomasks, Absorbance, Raster graphics, Binary data, Tin, Absorption

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Proceedings Article | 14 May 2004 Paper

Inorganic Bi/In thermal resist as a high-etch-ratio patterning layer for CF4/CHF3/O2 plasma etch

Yuqiang Tu, Glenn Chapman, Jun Peng

Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI

KEYWORDS: Optical lithography, Etching, Indium, Silicon, Photoresist materials, Wet etching, Bismuth, Plasma etching, Anisotropic etching, Plasma

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Proceedings Article | 30 December 2003 Paper

Bi/In thermal resist for both Si anisotropic wet etching and Si/SiO2 plasma etching

Glenn Chapman, Yuqiang Tu, Jun Peng

Proc. SPIE. 5342, Micromachining and Microfabrication Process Technology IX

KEYWORDS: Etching, Indium, Silicon, Photoresist materials, Wet etching, Bismuth, Plasma etching, Semiconducting wafers, Anisotropic etching, Plasma

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Proceedings Article | 17 December 2003 Paper

Creating direct-write gray-scale photomasks with bimetallic thin film thermal resists

Glenn Chapman, Yuqiang Tu, James Dykes, Masahiko Mio, Jun Peng

Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology

KEYWORDS: Glasses, Argon ion lasers, Semiconductor lasers, Photoresist materials, Photomasks, Absorbance, Bismuth, Raster graphics, Binary data, Absorption

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Proceedings Article | 12 June 2003 Paper

Wavelength invariant Bi/In thermal resist as a Si anisotropic etch masking layer and direct-write photomask material

Glenn Chapman, Yuqiang Tu, Jun Peng

Proc. SPIE. 5039, Advances in Resist Technology and Processing XX

KEYWORDS: Etching, Quartz, Glasses, Silicon, Argon ion lasers, Photomasks, Bismuth, Thermal modeling, Anisotropic etching, Absorption

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Showing 5 of 10 publications

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