Dr. Jun Yashima Profile

Dr. Jun Yashima

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 16 October 2020 Presentation + Paper

A deep learning mask analysis toolset using mask SEM digital twins

Ajay Baranwal, Suhas Pillai, Thang Nguyen, Jun Yashima, Jim Dewitt, Noriaki Nakayamada, Mikael Wahlsten, Aki Fujimura

Proc. SPIE. 11518, Photomask Technology 2020

KEYWORDS: Data modeling, Image processing, Digital filtering, Image analysis, Image registration, Scanning electron microscopy, Image quality, Image filtering, Image classification, Solid modeling

Read Abstract +

Proceedings Article | 25 October 2016 Paper

Electron beam mask writer EBM-9500 for logic 7nm node generation

Hideki Matsui, Takashi Kamikubo, Satoshi Nakahashi, Haruyuki Nomura, Noriaki Nakayamada, Mizuna Suganuma, Yasuo Kato, Jun Yashima, Victor Katsap, Kenichi Saito, Ryoei Kobayashi, Nobuo Miyamoto, Munehiro Ogasawara

Proc. SPIE. 9985, Photomask Technology 2016

KEYWORDS: Lithography, Electron beam lithography, Electron beams, Logic, Optical lithography, LCDs, Photomasks, Extreme ultraviolet, Electron beam melting, Line edge roughness

Read Abstract +

Proceedings Article | 9 July 2015 Paper

Study on modeling of resist heating effect correction in EB mask writer EBM-9000

Haruyuki Nomura, Takashi Kamikubo, Mizuna Suganuma, Yasuo Kato, Jun Yashima, Noriaki Nakayamada, Hirohito Anze, Munehiro Ogasawara

Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII

KEYWORDS: Electron beam lithography, Roentgenium, Modulation, Quartz, Diffusion, Computer simulations, Photomasks, Critical dimension metrology, Thermal modeling, Temperature metrology

Read Abstract +

Proceedings Article | 17 October 2014 Paper

EBM-9000: EB mask writer for product mask fabrication of 16nm half-pitch generation and beyond

Hidekazu Takekoshi, Takahito Nakayama, Kenichi Saito, Hiroyoshi Ando, Hideo Inoue, Noriaki Nakayamada, Takashi Kamikubo, Rieko Nishimura, Yoshinori Kojima, Jun Yashima, Akihito Anpo, Seiichi Nakazawa, Tomohiro Iijima, Kenji Ohtoshi, Hirohito Anze, Victor Katsap, Steven Golladay, Rodney Kendall

Proc. SPIE. 9235, Photomask Technology 2014

KEYWORDS: Electron beams, Seaborgium, Amplifiers, LCDs, Photomasks, Beam shaping, Electron beam melting, Mask making, Data conversion

Read Abstract +

Proceedings Article | 28 July 2014 Paper

EBM-9000: EB mask writer for product mask fabrication of 16nm half-pitch generation and beyond

Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI

KEYWORDS: Electron beams, Logic, Amplifiers, LCDs, Objectives, Photomasks, Electron beam melting, Mask making, Vestigial sideband modulation

Read Abstract +

Proceedings Article | 14 October 2011 Paper

Enhancement of global CD correction and data processing in EB mask writer EBM-8000

Hiroshi Matsumoto, Yasuo Kato, Tomoo Motosugi, Jun Yashima, Takayuki Abe, Noriaki Nakayamada, Shusuke Yoshitake, Kiyoshi Hattori

Proc. SPIE. 8166, Photomask Technology 2011

KEYWORDS: Data modeling, Modulation, Scattering, Data processing, Software development, Photomasks, Electron beam melting, Critical dimension metrology, Forward error correction, Data corrections

Read Abstract +

SPIE Journal Paper | 1 October 2008

High-accuracy correction of critical dimension errors taking sequence of large-scale integrated circuits fabrication processes into account

Takayuki Abe, Jun Yashima, Hayato Shibata, Yasuo Kato, Hiroshi Matsumoto, Tomohiro Iijama

JM3 Vol. 7 Issue 04

KEYWORDS: Critical dimension metrology, Forward error correction, Computed tomography, Semiconducting wafers, Convolution, Modulation, Integrated circuits, Photomasks, Lithography, Error analysis

Read Abstract +

SPIE Journal Paper | 1 April 2008

High-accuracy correction of critical dimension errors appearing in large-scale integration fabrication processes

Takayuki Abe, Jun Yashima, Hayato Shibata

JM3 Vol. 7 Issue 02

KEYWORDS: Critical dimension metrology, Computed tomography, Forward error correction, Convolution, Modulation, Fourier transforms, Semiconducting wafers, Erbium, Lithography, Numerical analysis

Read Abstract +

Proceedings Article | 30 October 2007 Paper

Correction technique of EBM-6000 prepared for EUV mask writing

Shusuke Yoshitake, Hitoshi Sunaoshi, Jun Yashima, Shuichi Tamamushi, Munehiro Ogasawara

Proc. SPIE. 6730, Photomask Technology 2007

KEYWORDS: Mirrors, Metrology, Error analysis, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, EUV optics

Read Abstract +

Proceedings Article | 14 May 2007 Paper

Study of heating effect on CAR in electron-beam mask writing

Takashi Kamikubo, Makoto Hiramoto, Jun Yashima, Masazumi Takahashi, Rieko Nishimura, Takehiko Katsumata, Hirohito Anze, Hitoshi Sunaoshi, Shuichi Tamamushi, Munehiro Ogasawara

Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV

KEYWORDS: Electron beams, Optical lithography, Cadmium, Polymers, Denoising, Computer simulations, Photomasks, Critical dimension metrology, Resolution enhancement technologies, Temperature metrology

Read Abstract +

Proceedings Article | 11 May 2007 Paper

Electron-beam mask writer EBM-6000 for 45-nm HP node

Jun Yashima, Kenji Ohtoshi, Noriaki Nakayamada, Hirohito Anze, Takehiko Katsumata, Tomohiro Iijima, Rieko Nishimura, Syuuichiro Fukutome, Nobuo Miyamoto, Seiji Wake, Yusuke Sakai, Shinji Sakamoto, Shigehiro Hara, Hitoshi Higurashi, Kiyoshi Hattori, Kenichi Saito, Rodney Kendall, Shuichi Tamamushi

Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV

KEYWORDS: Monochromatic aberrations, Electron beams, Manufacturing, Control systems, Photomasks, Beam shaping, Electron beam melting, Line edge roughness, Photoresist processing, Standards development

Read Abstract +

Showing 5 of 11 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years