Mr. Jung Youl Lee Profile

Jung Youl Lee

at Dongjin Semichem Co Ltd

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 4 December 2008 Paper

Influences of various defects on extreme ultra-violet mask

Eun-Jin Kim, Jee-Hye You, Jung-Youl Lee, Deog-Bae Kim, Jae-Hyun Kim, Hye-Keun Oh

Proc. SPIE. 7140, Lithography Asia 2008

KEYWORDS: Carbon, Lithography, Refractive index, Ultraviolet radiation, Silicon, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Molybdenum, Ruthenium

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Proceedings Article | 3 April 2007 Paper

Modified polymer architecture for immersion lithography

Sang Soo Kim, Jeong Woo Kim, Jung Youl Lee, Seung Keun Oh, Sang Hyang Lee, Jung Woo Kim, Jae Woo Lee, Deog bae Kim, Jaehyun Kim, Keun Do Ban, Cheol Kyu Bok, Seoung-Chan Moon

Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV

KEYWORDS: Polymers, Polymerization, Line width roughness, Palladium, Promethium, Immersion lithography, Line edge roughness, Photoresist processing, Semiconducting wafers, Polymer thin films

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Proceedings Article | 23 March 2007 Paper

Effect of deprotection activation energy on lithographic performance of EUVL resist

Sang-Jeoung Kim, Geun-Jong Yu, Jung-Yeol Lee, Hyun-Jin Kim, Jae-Woo Lee, Deog-Bae Kim, Yool Kang, Jaehyun Kim

Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV

KEYWORDS: Lithography, Polymers, Image processing, Molecules, Diffusion, Reflectivity, Image resolution, Extreme ultraviolet lithography, Line edge roughness, Photoresist processing

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Proceedings Article | 23 March 2007 Paper

Polymer structure modifications for immersion leaching control

Sang Hyang Lee, Jung Woo Kim, Jeong Woo Kim, Seung Keun Oh, Chan Sik Park, Jung Youl Lee, Sang Soo Kim, Jae Woo Lee, Deogbae Kim, Jaehyun Kim, Keun Do Ban, Cheol Kyu Bok, Seung Chan Moon

Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV

KEYWORDS: Semiconductors, Lithography, Polymers, Silicon, Manufacturing, Photoresist materials, Immersion lithography, Fluorine, Semiconducting wafers, Polymer thin films

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Proceedings Article | 29 March 2006 Paper

Parameter investigation of PEB sensitivity

Seung Keun Oh, Eun Kyung Son, Chan Sik Park, Jung Youl Lee, Jeong Woo Kim, Jae Woo Lee, Deog Bae Kim, Jaehyun Kim, Geunsu Lee, Seung-Chan Moon

Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII

KEYWORDS: Semiconductors, Lithography, Monochromatic aberrations, Polymers, Molecules, Diffusion, Photoresist materials, Critical dimension metrology, Photoresist processing, Semiconducting wafers

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