Dr. Jyhwei Hsu Profile

Dr. Jyhwei Hsu

Process Development Scientist, R&D at SUSS Microtec

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Publications (5)

Proceedings Article | 5 October 2016 Paper

Acoustic characterization of two megasonic devices for photomask cleaning

Claudio Zanelli, Dushyanth Giridhar, Manish Keswani, Nagaya Okada, Jyhwei Hsu, Petrie Yam

Proceedings Volume 9985, 998524 (2016) https://doi.org/10.1117/12.2243124

KEYWORDS: Acoustics, Cavitation, Transducers, Mask cleaning, Photomasks, Particles, Quartz, Sensors, Wave propagation, Electronics

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Proceedings Article | 4 October 2016 Paper

Megasonic cleaning strategy for sub-10nm photomasks

Jyh-Wei Hsu, Martin Samayoa, Peter Dress, Uwe Dietze, Ai-Jay Ma, Chia-Shih Lin, Rick Lai, Peter Chang, Laurent Tuo

Proceedings Volume 9985, 998515 (2016) https://doi.org/10.1117/12.2241143

KEYWORDS: SRAF, Photomasks, Cavitation, Particles, Inspection, Glasses, Plasma, Mask cleaning, Acoustics, Oxygen

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Proceedings Article | 23 October 2015 Paper

Ruthenium capping layer preservation for 100X clean through pH driven effects

Davide Dattilo, Uwe Dietze, Jyh-Wei Hsu

Proceedings Volume 9635, 96351B (2015) https://doi.org/10.1117/12.2202188

KEYWORDS: Oxidation, Ruthenium, Metals, Extreme ultraviolet, Silicon, Ions, Scanning electron microscopy, Photomasks, Oxygen, Ozone

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Proceedings Article | 30 October 2007 Paper

Performance improvement of ALTA4700 for 130nm and below mask productivity

Jyh Wei Hsu, David Lee, Chen Rui Tseng, Eric Hong, Chun Hung Wu

Proceedings Volume 6730, 67300I (2007) https://doi.org/10.1117/12.746654

KEYWORDS: Critical dimension metrology, Photomasks, Chromium, Dry etching, Etching, Printing, Photoresist processing, Diffusion, Deep ultraviolet, Metrology

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Proceedings Article | 3 May 2007 Paper

Aerial imaging performance of ALTA4700 printed mask for 130nm design rule

Jyh Wei Hsu, Chun Hung Wu, Kevin Cheng

Proceedings Volume 6533, 65331A (2007) https://doi.org/10.1117/12.736524

KEYWORDS: Photomasks, Electron beam melting, Semiconducting wafers, Scanning electron microscopy, Deep ultraviolet, Optical proximity correction, Critical dimension metrology, Airborne remote sensing, Manufacturing, Data modeling

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