Dr. K. C. Chen
Direct or at Macronix International Co Ltd
SPIE Involvement:
Author
Publications (33)

Proceedings Article | 22 February 2021 Presentation + Paper
Proc. SPIE. 11613, Optical Microlithography XXXIV
KEYWORDS: SRAF, Source mask optimization, Resolution enhancement technologies, Manufacturing, Lithography, 3D modeling, Printing, Photomasks, Molybdenum, Model-based design

Proceedings Article | 22 February 2021 Poster + Presentation + Paper
Proc. SPIE. 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
KEYWORDS: Overlay metrology, Optical filters, Semiconducting wafers, Optical testing, Etching, Detection and tracking algorithms, Wafer-level optics, Optical metrology, Metrology, Inspection

Proceedings Article | 22 February 2021 Presentation
Proc. SPIE. 11614, Design-Process-Technology Co-optimization XV
KEYWORDS: Lithography, Process modeling, Photomasks, Lead, Etching

Proceedings Article | 20 March 2018 Paper
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Calibration, Optical proximity correction, Data modeling, 3D modeling, Scanning electron microscopy, Critical dimension metrology, Photomasks, Feature extraction, Image segmentation, Semiconducting wafers

Proceedings Article | 13 March 2018 Paper
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Scanning electron microscopy, Image processing, Feature extraction, Critical dimension metrology, Lithography, Semiconducting wafers, Metrology, Image acquisition, Finite element methods, Optical proximity correction

Showing 5 of 33 publications
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