Dr. Kenichi Saito
Chief Specialist at NuFlare Technology Inc
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 25 October 2016 Paper
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Logic, Optical lithography, LCDs, Photomasks, Extreme ultraviolet, Electron beam melting, Line edge roughness

Proceedings Article | 17 October 2014 Paper
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Electron beams, Seaborgium, Amplifiers, LCDs, Photomasks, Beam shaping, Electron beam melting, Mask making, Data conversion

Proceedings Article | 28 July 2014 Paper
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Electron beams, Logic, Amplifiers, LCDs, Objectives, Photomasks, Electron beam melting, Mask making, Vestigial sideband modulation

Proceedings Article | 9 September 2013 Paper
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Semiconductors, Electron beams, Electrodes, Manufacturing, Power supplies, Photomasks, Photomask technology, Temperature metrology, Protactinium, Current controlled current source

Proceedings Article | 14 October 2011 Paper
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Amplifiers, Data processing, Photomasks, Extreme ultraviolet lithography, Immersion lithography, Mask making, Data conversion, Data corrections, Data storage servers

Showing 5 of 9 publications
Conference Committee Involvement (3)
Photomask Technology 2015
29 September 2015 | Monterey, California, United States
Photomask Technology 2014
16 September 2014 | Monterey, California, United States
SPIE Photomask Technology
10 September 2013 | Monterey, California, United States
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