Kangjoon Seo
at Hynix Semiconductor Inc
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 1 April 2013 Paper
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Reticles, Scanners, Particles, Inspection, Wafer inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Defect inspection

Proceedings Article | 26 May 2010 Paper
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Reticles, Scanners, Manufacturing, Inspection, Reflectivity, Scanning electron microscopy, Data processing, Photomasks, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 11 May 2009 Paper
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Lithography, Contamination, Air contamination, Inspection, Pellicles, Transmittance, Photomasks, Critical dimension metrology, Fluorine, Semiconducting wafers

Proceedings Article | 17 October 2008 Paper
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Refractive index, Optical lithography, Quartz, Laser scattering, Control systems, Printing, Ultrafast lasers, Photomasks, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 17 October 2008 Paper
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Lithography, Contamination, Quartz, Air contamination, Pellicles, Transmittance, Photomasks, Critical dimension metrology, Semiconducting wafers, 193nm lithography

Showing 5 of 8 publications
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